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Ibrahim, K.
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Ibrahim, K.
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Ibrahim, K.
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Characterization of MOS structure using low-k dielectric methylsilsesquioxane with evaporated and sputtered aluminium gate
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Aw, K.C.
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Ibrahim, K.
Published 2002
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Dual model describing effects of evaporated metal gate on low-k dielectric methylsilsesquioxane in metal oxide semiconductor capacitor structure
by
Aw, K.C.
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Ibrahim, K.
Published 2003
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