U-3M plasma startup scenario sustained by gas puffing as a different plasma confinement scenario: first results
In order to reduce flux of neutrals into the plasma confinement volume, discharge start-up scenario maintained by impulse gas puffing (GP) has been proposed. Absence of constant working gas feeding in this scenario opens a possibility to reduce working gas pressure in the U-3M vacuum vessel. It was...
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Date: | 2013 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2013
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Series: | Вопросы атомной науки и техники |
Subjects: | |
Online Access: | http://dspace.nbuv.gov.ua/handle/123456789/109254 |
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Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
Cite this: | U-3M plasma startup scenario sustained by gas puffing as a different plasma confinement scenario: first results / M.B. Dreval, E.L. Sorokovoy, Yu.K. Mironov, R.O. Pavlichenko, A.V. Lozin, V.S. Romanov, V.K. Pashnev // Вопросы атомной науки и техники. — 2013. — № 1. — С. 18-20. — Бібліогр.: 11 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of UkraineSummary: | In order to reduce flux of neutrals into the plasma confinement volume, discharge start-up scenario maintained by impulse gas puffing (GP) has been proposed. Absence of constant working gas feeding in this scenario opens a possibility to reduce working gas pressure in the U-3M vacuum vessel. It was shown that the time of entire vessel filling after sharp gas puffing pulse is about 10…20 ms. In discharges with 5…6 kV on the RF generators and proposed start-up scenario, a delay between GP pulse and plasma creation was shorter than the chamber filling time. The same level of the electron density has been achieved in the discharge under consideration and conventional 5…6 kV discharge maintained by the constant gas feeding only. The Hα emission waveform in the considered discharges is similar to its waveforms in the conventional devices where the sizes of vacuum chamber and plasma are close each other. |
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