Composition adjustment of vacuum-arc Ti-Al-N films, deposited with use of two-channel filter

Composite films were formed by vacuum-arc method using two plasma sources equipped with aluminum and titanium cathodes. The sources were coupled with a dual channel T-shaped magnetic filter. Ability of Ti-Al-N films composition adjustment by deposition of mixed plasma streams from the plasma sources...

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Bibliographic Details
Date:2011
Main Authors: Aksyonov, D.S., Aksenov, I.I., Luchaninov, A.A., Reshetnyak, E.N., Strel’nitskij, V.E.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2011
Series:Вопросы атомной науки и техники
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Online Access:http://dspace.nbuv.gov.ua/handle/123456789/111438
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Composition adjustment of vacuum-arc Ti-Al-N films, deposited with use of two-channel filter / D.S. Aksyonov, I.I. Aksenov, A.A. Luchaninov, E.N. Reshetnyak, V.E. Strel’nitskij // Вопросы атомной науки и техники. — 2011. — № 4. — С. 140-144. — Бібліогр.: 10 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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Summary:Composite films were formed by vacuum-arc method using two plasma sources equipped with aluminum and titanium cathodes. The sources were coupled with a dual channel T-shaped magnetic filter. Ability of Ti-Al-N films composition adjustment by deposition of mixed plasma streams from the plasma sources was investigated. It has been found that film composition can be varied by changing arc currents in plasma sources. However adjustment range of film composition is rather limited, and can be expanded by changing magnetic field intensity in anode area of plasma sources. Obtained films have uniform composition and thickness on 180 mm diameter surface. Conditions for aluminum content adjustment range from 14 to 60 wt.% were found.