Influence of component content of Ar/O₂ mixture on oxygen dissociation degree in plasma of low pressure discharge with hollow cathode
Influence of argon content in Ar/O₂ mixture on O₂ dissociation degree and atomic oxygen concentration in the plasma of low pressure glow discharge with hollow cathode is determined experimentally and theoretically. It is found that atomic oxygen concentration dependence on argon content in the mixtu...
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| Zitieren: | Influence of component content of Ar/O₂ mixture on oxygen dissociation degree in plasma of low pressure discharge with hollow cathode / V.Yu. Bazhenov, Yu.V. Lavrookevich, V.M. Piun, A.V. Ryabtsev, V.V. Tsiolko // Вопросы атомной науки и техники. — 2015. — № 4. — С. 172-176. — Бібліогр.: 20 назв. — англ. |
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irk-123456789-1121362017-01-18T03:02:43Z Influence of component content of Ar/O₂ mixture on oxygen dissociation degree in plasma of low pressure discharge with hollow cathode Bazhenov, V.Yu. Lavrookevich, Yu.V. Piun, V.M. Ryabtsev, A.V. Tsiolko, V.V. Плазменно-пучковый разряд, газовый разряд и плазмохимия Influence of argon content in Ar/O₂ mixture on O₂ dissociation degree and atomic oxygen concentration in the plasma of low pressure glow discharge with hollow cathode is determined experimentally and theoretically. It is found that atomic oxygen concentration dependence on argon content in the mixture exhibits non-monotonous behavior with a minimum at Ar/(Ar+O₂) ≈ 50%. Results of calculation and experiment are in a good agreement. Експериментально та теоретично встановлено вплив вмісту аргону в суміші Ar/O₂ на ступінь дисоціації O₂ та концентрацію атомарного кисню в плазмі жевріючого розряду низького тиску з порожнистим катодом. Встановлено, що залежність концентрації атомарного кисню від вмісту аргону в суміші має немонотонний характер з мінімумом при Ar/(Ar+O₂) ~50%. Результати розрахунку та експерименту достатньо гарно узгоджуються. Экспериментально и теоретически установлено влияние содержания аргона в смеси Ar/O₂ на степень диссоциации O₂ и концентрацию атомарного кислорода в плазме тлеющего разряда низкого давления с полым катодом. Установлено, что зависимость концентрации атомарного кислорода от содержания аргона в смеси носит немонотонный характер с минимумом при Ar/(Ar+O₂) ~50%. Результаты расчета и эксперимента находятся в хорошем согласии. 2015 Article Influence of component content of Ar/O₂ mixture on oxygen dissociation degree in plasma of low pressure discharge with hollow cathode / V.Yu. Bazhenov, Yu.V. Lavrookevich, V.M. Piun, A.V. Ryabtsev, V.V. Tsiolko // Вопросы атомной науки и техники. — 2015. — № 4. — С. 172-176. — Бібліогр.: 20 назв. — англ. 1562-6016 PACS: 52.80.-s, 52.25.Ya http://dspace.nbuv.gov.ua/handle/123456789/112136 en Вопросы атомной науки и техники Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
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Плазменно-пучковый разряд, газовый разряд и плазмохимия Плазменно-пучковый разряд, газовый разряд и плазмохимия |
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Плазменно-пучковый разряд, газовый разряд и плазмохимия Плазменно-пучковый разряд, газовый разряд и плазмохимия Bazhenov, V.Yu. Lavrookevich, Yu.V. Piun, V.M. Ryabtsev, A.V. Tsiolko, V.V. Influence of component content of Ar/O₂ mixture on oxygen dissociation degree in plasma of low pressure discharge with hollow cathode Вопросы атомной науки и техники |
| description |
Influence of argon content in Ar/O₂ mixture on O₂ dissociation degree and atomic oxygen concentration in the plasma of low pressure glow discharge with hollow cathode is determined experimentally and theoretically. It is found that atomic oxygen concentration dependence on argon content in the mixture exhibits non-monotonous behavior with a minimum at Ar/(Ar+O₂) ≈ 50%. Results of calculation and experiment are in a good agreement. |
| format |
Article |
| author |
Bazhenov, V.Yu. Lavrookevich, Yu.V. Piun, V.M. Ryabtsev, A.V. Tsiolko, V.V. |
| author_facet |
Bazhenov, V.Yu. Lavrookevich, Yu.V. Piun, V.M. Ryabtsev, A.V. Tsiolko, V.V. |
| author_sort |
Bazhenov, V.Yu. |
| title |
Influence of component content of Ar/O₂ mixture on oxygen dissociation degree in plasma of low pressure discharge with hollow cathode |
| title_short |
Influence of component content of Ar/O₂ mixture on oxygen dissociation degree in plasma of low pressure discharge with hollow cathode |
| title_full |
Influence of component content of Ar/O₂ mixture on oxygen dissociation degree in plasma of low pressure discharge with hollow cathode |
| title_fullStr |
Influence of component content of Ar/O₂ mixture on oxygen dissociation degree in plasma of low pressure discharge with hollow cathode |
| title_full_unstemmed |
Influence of component content of Ar/O₂ mixture on oxygen dissociation degree in plasma of low pressure discharge with hollow cathode |
| title_sort |
influence of component content of ar/o₂ mixture on oxygen dissociation degree in plasma of low pressure discharge with hollow cathode |
| publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| publishDate |
2015 |
| topic_facet |
Плазменно-пучковый разряд, газовый разряд и плазмохимия |
| url |
http://dspace.nbuv.gov.ua/handle/123456789/112136 |
| citation_txt |
Influence of component content of Ar/O₂ mixture on oxygen dissociation degree in plasma of low pressure discharge with hollow cathode / V.Yu. Bazhenov, Yu.V. Lavrookevich, V.M. Piun, A.V. Ryabtsev, V.V. Tsiolko // Вопросы атомной науки и техники. — 2015. — № 4. — С. 172-176. — Бібліогр.: 20 назв. — англ. |
| series |
Вопросы атомной науки и техники |
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| fulltext |
ISSN 1562-6016. ВАНТ. 2015. №4(98) 172
INFLUENCE OF COMPONENT CONTENT OF Ar/O2 MIXTURE
ON OXYGEN DISSOCIATION DEGREE IN PLASMA
OF LOW PRESSURE DISCHARGE WITH HOLLOW CATHODE
V.Yu. Bazhenov, Yu.V. Lavrookevich, V.M. Piun, A.V. Ryabtsev, V.V. Tsiolko
Institute of Physics NASU, Kiev, Ukraine
E-mail: digit@meta.ua
Influence of argon content in Ar/O2 mixture on O2 dissociation degree and atomic oxygen concentration in the
plasma of low pressure glow discharge with hollow cathode is determined experimentally and theoretically. It is
found that atomic oxygen concentration dependence on argon content in the mixture exhibits non-monotonous be-
havior with a minimum at Ar/(Ar+O2) ≈ 50%. Results of calculation and experiment are in a good agreement.
PACS: 52.80.-s, 52.25.Ya
INTRODUCTION
Oxygen discharges are widely used in plasma tech-
nologies, particularly, for photoresist etching, modifica-
tion of surface features of materials, deposition of thin
oxide films, etc. [1 - 3]. For all those applications it is
important to know the density of active particles, as well
as its dependence on the plasma parameters (i.e. pres-
sure, power, gas mixture composition, etc.). Most often,
technological applications are realized using the dis-
charges in mixtures of oxygen and inert gases, rather
than those in pure oxygen. Inert gas adding to ixygen
can essentially increase the rates of plasma-chemical
processes. Particularly, in [4] it has been shown that
photoresist etching rate by the plasma of discharge in
50% Ar/O2 mixture is twice higher than that in case of
use of the discharge in pure oxygen.
Purpose of our work is an investigation of the influ-
ence of argon adding in working gas mixture on oxygen
dissociation degree, as well as the dependence of atomic
oxygen concentration value in the negative glow plasma
of low pressure discharge on argon content in the gas
mixture.
1. THEORETICAL MODEL
For calculations of dependencies of plasma compo-
nent concentrations on the gas mixture content, aver-
aged model of plasma-chemical processes in hollow
cathode discharge was built. The model was mainly
analogous to one considered in [1]. We assumed that the
component concentrations are uniformly spread over the
whole volume of the chamber represented by cylinder
with diameter D = 38 cm and length L = 42 cm.
In the kinetics calculations we considered 18 com-
ponents. For oxygen, the following species were con-
sidered: molecular oxygen in both ground state
O2(X3Σg), and in excited metastable states O2(a1Dg),
O2(b1Σg
+) and O2(A3Σu
+, A3Δu, c1Σu
-); atomic oxygen
ground state O(3P) and at metastable level O(1D); ozone
O3, as well as positive ions O+ and O2
+, and negative
ions O-, O2
- and O3
-. Argon atoms were considered as
the following species: the ground state Ar(3s23p6), met-
astable levels Arm (mixture of 1s5 and 1s3 levels with
fixed ratio of 5:1), radiation-bounded levels Arr (1s2 and
1s4 levels), all levels Ar(4p), as well as Ar+ ions. Total-
ly, in the calculations 131 elementary processes were
taken into consideration. Rate constants for all reactions
were taken the same as in [5], excluding reactions of
oxygen dissociation and ionization, argon ionization in
ground and metastable states, as well as reactions of
excitation of electron levels of molecular oxygen and
argon.
0 5 10 15 20 25 30
10-6
10-5
10-4
10-3
10-2
10-1
100
101
% Ar
0%
2%
50%
80%
100%
f(ε
),
eV
-3
/2
ε, eV
Fig. 1. Electron energy distribution function in Ar/O2
mixture for different argon content. Total pressure is
4 Pa, electric field strength is 20 mV/cm, power intro-
duced into the discharge is 250 W
Mentioned constants were determined from electron
energy distribution function (EEDF) which was ob-
tained by solving Boltzman equation, which was solved
together with the system of kinetic equations. The
EEDF f(ε) was normalized as follows:
∫
∞
=
0
1)(εε f .
At solving this equation, electron energy losses to
ionization of molecular oxygen and argon, oxygen dis-
sociation, excitation of the first seven electron levels of
molecular oxygen, argon levels 1s and 2p (including
stepwise excitation 1s → 2p), and oxygen oscillation
levels were taken into account. Electron heating was
done by electric field with a strength assumed to be
20 mV/cm, as well as at the expense of “secondary”
electrons formed at the gas ionization by electrons ac-
celerated in the near-cathode layer. The dependence of
energy distribution of these “secondary” electrons was
considered to be proportional to 1/(ε2 + ε0
2), where ε0 is
ionization energy, and the formation density was deter-
mined following from power density introduced into the
discharge, and the energy spent to ionization, excitation
of the atoms and the molecules, and dissociation. Cross
section values for electron processes used for calcula-
tions of rate constants, as well as EEDF calculation,
were taken from [6 - 11].
ISSN 1562-6016. ВАНТ. 2015. №4(98) 173
Fig. 1 exhibits EEDF appearance for different con-
tent of the mixture. One can see that argon adding re-
sults in the increase of portion of electrons having ener-
gy higher than 12 eV, which in turn results in the in-
crease of the rate constant of oxygen dissociation by
electron hits (Fig. 2).
Fig. 2. Dependencies of constant of molecular oxygen
dissociation by electron hits (solid curve, left axis) and
the rate of dissociation by electron hits (dashed curve,
right axis) on argon content in the discharge mixture.
The discharge parameters are the same, as in Fig. 1
0 20 40 60 80 100
0,0
5,0x1011
1,0x1012
1,5x1012
2,0x1012
2,5x1012
3,0x1012
[O], cm-3
Ar/(Ar+O2), %
Fig. 3. Dependence of calculated atomic oxygen concen-
tration in the discharge on argon content in the mixture.
The discharge parameters are the same as in Fig. 1
However, a multiple of this constant and molecular
oxygen concentration is practically independent on oxy-
gen content in the discharge mixture up to 10% value.
Thus, if the dissociation would be the only channel of
atomic oxygen formation, its concentration should be
unchanged for all mixtures, and should abruptly drop at
molecular oxygen content approach to zero value. Ex-
actly such behavior is observed in RF discharges. How-
ever, as one can see from Fig. 3, calculated dependence
of atomic oxygen concentration has non-monotonous
appearance. That is, in hollow cathode discharge the
dissociation is not the single channel of atomic oxygen
formation. As it is shown by both calculations and ex-
periment, large amount of oxygen negative ions should
be present in such discharge, so that a native assumption
can be made regarding an influence of these ions on the
processes of atomic oxygen formation. However, clari-
fication of particular mechanism of influence of the ions
on atomic oxygen concentration requires further inves-
tigations.
2. EXPERIMENTAL SETUP AND METHODS
The schematic diagram of the experimental setup
with diagnostic system [TRG-OES] (trace rare gases
optical emission spectroscopy) is shown in Fig. 4. Hol-
low cathode discharge plasma was created in cylindrical
working chamber 3 made of stainless steel with 38 cm
diameter and 42 cm length, which served as the dis-
charge cathode. The discharge anode 2 was a disk made
of copper with 30 cm diameter located near one of the
chamber end walls. Another end wall of the chamber
was elaborated from usual glass, and was used for spec-
trum measurements of the discharge plasma emission.
Fig. 4. Schematic diagram of the experimental setup:
1 – illuminator based on incandescent lamp;
2 – discharge anode; 3 – discharge cathode; 4 – lens;
5 – light guide; 6 – collimator; 7 – light flux chopper;
8 – monochromator MDR-23; 9 – liquid nitrogen cooled
PMT FEU-62
Chamber evacuation was done by means of diffusion
pump down to residual gas pressure of about 5·10-3 Pa,
and after that working gas mixture was supplied till the
pressure of 4 Pa. To avoid oil vapor coming into work-
ing chamber, the diffusion pump was equipped by a trap
cooled by liquid nitrogen. Argon content in working
mixture was varied from 1 to 70% with maintaining of
the gas filling pressure of 4 Pa. The discharge electgric
power supply was performed by means of DC source
with controlled voltage and discharge current. At varia-
tion of gas mixture parameters, power introduced into
the discharge was maintained at unchanged value of
230 W.
Spectrum measurements in the experiment were per-
formed by means of optical system based on the use of
2 3 4 5
1
Plasma
PC
9 8 7 6
ISSN 1562-6016. ВАНТ. 2015. №4(98) 174
monochromator MDR-23 (diffraction grating had spa-
tial frequency of 1200 lines per millimeter). Spatial se-
lection of the plasma emission from small (about 2 cm
diameter) part of the discharge was done by lens 4,
which could be moved in radial direction. Input end of
fiber-optic light guide 5 was located in focal plane of
the lens 4. The light guide length was 10 m. Radiation
from its output end was delivered to input slit of the
monochromator by means of collimator 6. Light flux
was modulated by means of chopper 7 with 120 ms pe-
riod. For detection of the radiation, photomultiplier tube
(PMT) of FEU-62 type (9), cooled by liquid nitrogen
with the use of specially developed cryostat, was used.
Studied spectrum range was limited by the light guide
transmission, and comprised 550…1000 nm. Calibra-
tion of spectrum sensitivity of the system was accom-
plished with the use of incandescent lamp of OP-33-03
type, at that the lamp emission spectrum was measured
with the lens 4 placement in a center of the discharge
chamber window.
PMT signal was digitized by 16-bit ADC and pro-
cessed by means of specially developed software for
obtaining desired signal-to-noise ratio. The processing
was based on dark signal subtraction synchronously
with chopper 7 operation, data averaging (acquisition
time for spectrum interval of 3 nm was about 5 minutes)
and determining intensities of atomic lines using a value
of the square under spectrum dependence of the emis-
sion interpolated accordingly to response function of the
monochromator. For efficiency enhancement of the last
stage of processing, triangle shape of response function
was used, which was created by means of setting wide
enough equal widths (0.4 mm) of input and output slits
of the monochromator.
In optical measurements emission of oxygen atoms
at 844.6 nm wavelength, corresponding to 3р3Р 3s3S
transition, and those of argon atoms at 750.4 and
751.4 nm wavelengths, corresponding to 2р1 1s2 and
2р5 1s4 transitions (Paschen notation) were used.
For determining oxygen dissociation degree acti-
nometry method [12] was used taking into account dis-
sociative populating of oxygen level (O, 3p3P) [13], in
accordance to which
P
e
P
dep
P K
K
I
IC
O
O
3
3
750
84412
3
2][
][
−= ,
where
][
][
][
][
2
3
12
2
1212
2
33
3
12
844
75012
3 O
Ar
K
K
OkA
OkA
A
A
h
h
C P
e
p
e
p
Q
p
ij
P
Q
P
ij
P
ij
p
ijp
P
+
+
=
∑
∑
ν
ν
,
844I , 750I are intensities of emission lines of oxygen at
844 nm wavelength and argon at 750 nm wavelength,
respectively, P
deK 3 , P
eK 3 , 12 p
eK are rates of dissociative
populating of oxygen level, and populating the levels of
oxygen and argon by electron hits, respectively, 12 p
ijA ,
P
ijA3 are Einstein coefficients for argon and oxygen
levels, ∑ 12 p
ijA , ∑ P
ijA3 are sums of Einstein coeffi-
cients for argon and oxygen levels in case of branching,
][ 2
3 Ok P
Q , ][ 2
12 Ok p
Q are rates of quenching excited lev-
els of oxygen and argon. At that, it should be noted that
the rates of reactions
∫
∞
⋅⋅⋅=
0
)()(2 εεσεε df
m
eK
e
,
were calculated taking into consideration total cross
sections (σe(Ar, 2p1) for argon level 2p1 populating by
electron hits, σe(O, 3p3P) for oxygen level 3p3P popu-
lating by electron hits, and σde(O, 3p3P) for dissociative
populating of oxygen level 3p3P), which take into ac-
count cascading in the populating of considered acti-
nometry levels [14]. Corresponding spectroscopic data
for the lines used in calculations were taken from NIST
database [15].
Fig. 5 presents excitation cross sections of the states
[16 - 18] used by us in determination of molecular oxy-
gen dissociation degree, and examples of calculated f(ε)
for two values of argon concentration in the mixture.
0 20 40
1E-7
1E-5
1E-3
0,1
10
1E-19
1E-18
1E-17
f(ε
),
eV
-3
/2
Energy ε, eV
Cr
os
s
se
ct
io
n
σ,
c
m
2
σde (O, 3p3P)
σe (Ar, 2p1)
σe (O, 3p3P)
Fig. 5. Calculated f(ε): solid line – 0% argon fraction;
dashed line – 80% argon fraction in gas mixture.
Apparent excitation cross sections of Ar(2p1)
and O(3p3P) states
3. RESULTS AND DISCUSSIONS
One can see from Fig. 6,a,b that with Ar concentra-
tion increase in the mixture, argon emission intensity
I750 grows up essentially faster in comparison with emis-
sion of oxygen line I844 decrease. It in turn results in
abrupt decrease of intensity ratio I844/I750 with Ar con-
tent increase in the mixture.
In Fig. 7,a dependence of molecular oxygen dissoci-
ation degree [O]/[O2] on argon content in the mixture
obtained with the use of intensity ratio I844/I750 from
Fig.6 is presented. One can see from the figure that ar-
gon adding to oxygen results in abrupt decrease of the
dissociation degree – [O]/[O2] decreases from ≈12% at
Ar/(Ar+O2) = 0% down to ≈ 2.5% at Ar/(Ar+O2)
~20…30 %. At subsequent argon content increase, the
dissociation degree increases and reaches ~15% at
Ar/(Ar+O2) = 80%.
From Fig. 7,b one can see that, at first, [O] concen-
tration value monotonously decreases with argon con-
tent increase in working mixture, and reaches a value of
~1013 cm-3 at Ar/(Ar+O2) being higher than about
10…15%, and subsequently increases up to
~ 3·1013 cm-3 at 80% argon content in the mixture.
ISSN 1562-6016. ВАНТ. 2015. №4(98) 175
0 20 40 60
0,00
0,02
0,04
I,
a.
u.
Ar/(Ar+O2), %
a)
0 20 40 60
1
10
I 84
4/I
75
0
Ar/(Ar+O2), %
b)
0 20 40 60
1
10
I 84
4/I
75
0
Ar/(Ar+O2), %
b)
Fig. 6. Experimental measured dependencies of
emission intensities I844 – () and I750 – () on per-
centage of argon content in plasma generating mixture
(a), and dependence of the ratio I844 /I750 (b)
Experimental obtained [O] dependence on argon
content in the mixture is generally in agreement with
calculated one (see Figs. 7,b and 3). Both of them ex-
hibit non-monotonous dependence of [O] on argon con-
tent in the mixture at Ar/(Ar+O2) variation from several
to 80%. Certain discrepancy exists al small argon con-
tent – in the calculation we observe local maximum of
[O] at argon content of about 2%, while experimental
obtained dependence possesses even behavior. It is due
to fact that in the experiment argon concentration in-
crements were too large for observation of this maxi-
mum. In subsequent, we plan to accomplish [O] value
measurements in Ar concentration range ~0.5…5% with
smaller increments of the last value.
Besides, numeric modeling gives [O] values lower
by about an order of magnitude, as compared to experi-
mental data, which can be explained by peculiarities of
the used model and inaccuracies of the values of cross
sections and rates for the processes considered in the
calculations (see section 2).
[O] value growth at argon concentration increase
from ~50 tо 80% looks somewhat unclear, both in the
calculation, and in the experiment.
In general, it should be noted that the behavior of
atomic oxygen concentration dependence on argon con-
tent in the mixture Ar/O2 essentially depends on both
the type of used discharge, and its parameters. In al-
ready mentioned article [4] the authors state that that
maximum concentration [O] is achieved at 1:1 quantita-
tive ratio in Ar/O2 mixture.
0 20 40 60
0,00
0,05
0,10
0,15
a[O]/[O2]
Ar/(Ar+O2), %
0 20 40 60
0,0
5,0x1013
1,0x1014
[O], cm-3
Ar/(Ar+O2), %
Fig. 7. Dependencies of oxygen dissociation degree
[O]/[O2] with calculated EEDF versus Ar percentage in
working gas mixture (a), and atomic oxygen
concentration dependencies (b)
In [19] the authors also note an increase of atomic
oxygen amount in Ar/O2 mixture, and it occurs already
at 20% argon adding to the mixture. In [5] an extremum
in behavior of atomic oxygen amount in Ar/O2 mixture
was not observed and a drop of [O] value occurred at Ar
content in the mixture > 90%. Authors of [20] used dif-
ferent plasma generating mixture Ar/N2, and noted
atomic nitrogen concentration maximum at 20…25% of
Ar content in the mixture.
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Article received 01.06.2015
ВЛИЯНИЕ КОМПОНЕНТНОГО СОСТАВА СМЕСИ Ar/O2 НА СТЕПЕНЬ ДИССОЦИАЦИИ
КИСЛОРОДА В ПЛАЗМЕ РАЗРЯДА НИЗКОГО ДАВЛЕНИЯ С ПОЛЫМ КАТОДОМ
В.Ю. Баженов, Ю.В. Лаврукевич, В.М. Пиун, А.В. Рябцев, В.В. Циолко
Экспериментально и теоретически установлено влияние содержания аргона в смеси Ar/O2 на степень
диссоциации O2 и концентрацию атомарного кислорода в плазме тлеющего разряда низкого давления с по-
лым катодом. Установлено, что зависимость концентрации атомарного кислорода от содержания аргона в
смеси носит немонотонный характер с минимумом при Ar/(Ar+O2) ~50%. Результаты расчета и эксперимен-
та находятся в хорошем согласии.
ВПЛИВ КОМПОНЕНТНОГО СКЛАДУ СУМІШІ Ar/O2 НА СТУПІНЬ ДИСОЦІАЦІЇ КИСНЮ
В ПЛАЗМІ РОЗРЯДУ НИЗЬКОГО ТИСКУ З ПОРОЖНИСТИМ КАТОДОМ
В.Ю. Баженов, Ю.В. Лаврукевич, В.М. Піун, А.В. Рябцев, В.В. Ціолко
Експериментально та теоретично встановлено вплив вмісту аргону в суміші Ar/O2 на ступінь дисоціації
O2 та концентрацію атомарного кисню в плазмі жевріючого розряду низького тиску з порожнистим катодом.
Встановлено, що залежність концентрації атомарного кисню від вмісту аргону в суміші має немонотонний
характер з мінімумом при Ar/(Ar+O2) ~50%. Результати розрахунку та експерименту достатньо гарно узго-
джуються.
INTRODUCTION
1. THEORETICAL MODEL
2. EXPERIMENTAL SETUP AND METHODS
3. RESULTS AND DISCUSSIONS
REFERENCES
ВЛИЯНИЕ КОМПОНЕНТНОГО СОСТАВА СМЕСИ Ar/O2 НА СТЕПЕНЬ ДИССОЦИАЦИИ КИСЛОРОДА В ПЛАЗМЕ РАЗРЯДА НИЗКОГО ДАВЛЕНИЯ С ПОЛЫМ КАТОДОМ
ВПЛИВ КОМПОНЕНТНОГО СКЛАДУ СУМІШІ Ar/O2 НА СТУПІНЬ ДИСОЦІАЦІЇ КИСНЮ В ПЛАЗМІ РОЗРЯДУ НИЗЬКОГО ТИСКУ З ПОРОЖНИСТИМ КАТОДОМ
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