Power absorption inside helicon plasma of helium RF ion source in nonaxial magnetic field
The paper studies integral and one-dimensional distribution of RF electromagnetic field absorption in a helicon plasma with external magnetic field directed at an angle to a plasma plane. A simplified model of a helicon plasma plane layer is used here. Calculation results are used to explain power a...
Gespeichert in:
| Datum: | 2015 |
|---|---|
| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2015
|
| Schriftenreihe: | Вопросы атомной науки и техники |
| Schlagworte: | |
| Online Zugang: | http://dspace.nbuv.gov.ua/handle/123456789/112242 |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Power absorption inside helicon plasma of helium RF ion source in nonaxial magnetic field / O.V. Alexenko, V.I. Miroshnichenko, V.I. Voznyi // Вопросы атомной науки и техники. — 2015. — № 4. — С. 12-17. — Бібліогр.: 15 назв. — англ. |
Institution
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Zusammenfassung: | The paper studies integral and one-dimensional distribution of RF electromagnetic field absorption in a helicon plasma with external magnetic field directed at an angle to a plasma plane. A simplified model of a helicon plasma plane layer is used here. Calculation results are used to explain power absorption in a compact helicon ion source with nonuniform external magnetic field. An ion source is a part of a nuclear scanning microprobe (NSMP) injector at the Institute of Applied Physics NAS of Ukraine. Calculations for ion source parameters of the NSMP injector show a resonant behaviour of integral RF power absorption as a function of a magnetic field inclination angle. A model (planar) geometry is verified here for solution of this problem. |
|---|