Power absorption inside helicon plasma of helium RF ion source in nonaxial magnetic field

The paper studies integral and one-dimensional distribution of RF electromagnetic field absorption in a helicon plasma with external magnetic field directed at an angle to a plasma plane. A simplified model of a helicon plasma plane layer is used here. Calculation results are used to explain power a...

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Bibliographic Details
Date:2015
Main Authors: Alexenko, O.V., Miroshnichenko, V.I., Voznyi, V.I.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2015
Series:Вопросы атомной науки и техники
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Online Access:http://dspace.nbuv.gov.ua/handle/123456789/112244
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Power absorption inside helicon plasma of helium RF ion source in nonaxial magnetic field / O.V. Alexenko, V.I. Miroshnichenko, V.I. Voznyi // Вопросы атомной науки и техники. — 2015. — № 4. — С. 12-17. — Бібліогр.: 15 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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Summary:The paper studies integral and one-dimensional distribution of RF electromagnetic field absorption in a helicon plasma with external magnetic field directed at an angle to a plasma plane. A simplified model of a helicon plasma plane layer is used here. Calculation results are used to explain power absorption in a compact helicon ion source with nonuniform external magnetic field. An ion source is a part of a nuclear scanning microprobe (NSMP) injector at the Institute of Applied Physics NAS of Ukraine. Calculations for ion source parameters of the NSMP injector show a resonant behaviour of integral RF power absorption as a function of a magnetic field inclination angle. A model (planar) geometry is verified here for solution of this problem.