Current transport mechanisms in metal – high-k dielectric – silicon structures

The mechanism of current transport in several high k -dielectric, including rare earth metal oxides (Gd₂O₃, Nd₂O₃), ternary compounds (LaLuO₃) and rare earth metal silicate (LaSiOx) thin films on silicon was studied using current-voltage ( I - V ) and conductance-frequency measurements at temper...

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Bibliographic Details
Date:2012
Main Author: Gomeniuk, Y.V.
Format: Article
Language:English
Published: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2012
Series:Semiconductor Physics Quantum Electronics & Optoelectronics
Online Access:http://dspace.nbuv.gov.ua/handle/123456789/118283
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Current transport mechanisms in metal – high-k dielectric – silicon structures / Y.V. Gomeniuk // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 2. — С. 139-146. — Бібліогр.: 35 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine