Magnetic susceptibility of n- and p-Si single crystals containing thermodonors
Using a series of experimental methods (Hall effect, electron paramagnetic resonance and magnetic susceptibility (MS, χ)) comparison has been made for the kinetics of formation inherent to different types of thermodonors (TDs) (doubly-charged and shallow ones) under thermal treatments (TT) at 450...
Gespeichert in:
| Datum: | 2010 |
|---|---|
| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2010
|
| Schriftenreihe: | Semiconductor Physics Quantum Electronics & Optoelectronics |
| Online Zugang: | http://dspace.nbuv.gov.ua/handle/123456789/118557 |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Magnetic susceptibility of n- and p-Si single crystals containing thermodonors / V.М. Babich, M.M. Luchkevych, V.M. Tsmots // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2010. — Т. 13, № 4. — С. 384-388. — Бібліогр.: 12 назв. — англ. |
Institution
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Zusammenfassung: | Using a series of experimental methods (Hall effect, electron paramagnetic
resonance and magnetic susceptibility (MS, χ)) comparison has been made for the
kinetics of formation inherent to different types of thermodonors (TDs) (doubly-charged
and shallow ones) under thermal treatments (TT) at 450 °C with the kinetics of
paramagnetic center accumulation in the samples obtained by the MS method. The
absence of correlation between these dependences has been shown. The dependences
χ(H) obtained both at 300 and 77 K that have orientation and paramagnetic component
determine neither of these two kinds of TD-centers as it was in the case of 450 °C TT for
p-Si(B) samples where the χ
par component is determined by the concentration of deep
TDs (Еі ≥ 0.2 еV). The χ(H) value in the n-Si(P) samples after TT at 450 °C is
determined, evidently, by intermediate non-stable complexes, as well as by those formed
during rapid cooling the samples |
|---|