Perspectives for using technology of laser thermolithography
Analyzed in this work are the requirements to an optical system for laser thermolithographic recording. It has been shown that possibilities of this type recording with decreasing the registered element sizes can be realized only when using special measures for stabilizing both exposing radiation...
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| Дата: | 2012 |
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| Автори: | , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
2012
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| Назва видання: | Semiconductor Physics Quantum Electronics & Optoelectronics |
| Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/118722 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Perspectives for using technology of laser thermolithography / A.A. Kryuchyn, A.S. Lapchuk, A.I. Bryts’kyi, S.O. Kostyukevych // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 4. — С. 328-332. — Бібліогр.: 9 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| id |
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dspace |
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irk-123456789-1187222017-06-01T03:02:51Z Perspectives for using technology of laser thermolithography Kryuchyn, A.A. Lapchuk, A.S. Bryts’kyi, A.I. Kostyukevych, S.O. Analyzed in this work are the requirements to an optical system for laser thermolithographic recording. It has been shown that possibilities of this type recording with decreasing the registered element sizes can be realized only when using special measures for stabilizing both exposing radiation power and duration of laser pulses. Using the thermolithographic method for making super-dense patterns also requires creation of a specific system for dynamic focusing with accuracy better than 100 nm. It has been shown that the specific heat of thermochemical reaction and thermal resistance of a substrate are critical parameters for this method. 2012 Article Perspectives for using technology of laser thermolithography / A.A. Kryuchyn, A.S. Lapchuk, A.I. Bryts’kyi, S.O. Kostyukevych // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 4. — С. 328-332. — Бібліогр.: 9 назв. — англ. 1560-8034 PACS 81.16.Nd http://dspace.nbuv.gov.ua/handle/123456789/118722 en Semiconductor Physics Quantum Electronics & Optoelectronics Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| language |
English |
| description |
Analyzed in this work are the requirements to an optical system for laser
thermolithographic recording. It has been shown that possibilities of this type recording
with decreasing the registered element sizes can be realized only when using special
measures for stabilizing both exposing radiation power and duration of laser pulses.
Using the thermolithographic method for making super-dense patterns also requires
creation of a specific system for dynamic focusing with accuracy better than 100 nm. It
has been shown that the specific heat of thermochemical reaction and thermal resistance
of a substrate are critical parameters for this method. |
| format |
Article |
| author |
Kryuchyn, A.A. Lapchuk, A.S. Bryts’kyi, A.I. Kostyukevych, S.O. |
| spellingShingle |
Kryuchyn, A.A. Lapchuk, A.S. Bryts’kyi, A.I. Kostyukevych, S.O. Perspectives for using technology of laser thermolithography Semiconductor Physics Quantum Electronics & Optoelectronics |
| author_facet |
Kryuchyn, A.A. Lapchuk, A.S. Bryts’kyi, A.I. Kostyukevych, S.O. |
| author_sort |
Kryuchyn, A.A. |
| title |
Perspectives for using technology of laser thermolithography |
| title_short |
Perspectives for using technology of laser thermolithography |
| title_full |
Perspectives for using technology of laser thermolithography |
| title_fullStr |
Perspectives for using technology of laser thermolithography |
| title_full_unstemmed |
Perspectives for using technology of laser thermolithography |
| title_sort |
perspectives for using technology of laser thermolithography |
| publisher |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України |
| publishDate |
2012 |
| url |
http://dspace.nbuv.gov.ua/handle/123456789/118722 |
| citation_txt |
Perspectives for using technology of laser thermolithography / A.A. Kryuchyn, A.S. Lapchuk, A.I. Bryts’kyi, S.O. Kostyukevych // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2012. — Т. 15, № 4. — С. 328-332. — Бібліогр.: 9 назв. — англ. |
| series |
Semiconductor Physics Quantum Electronics & Optoelectronics |
| work_keys_str_mv |
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2025-07-08T14:31:50Z |
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2025-07-08T14:31:50Z |
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