Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil
The conditions for the optimal balance among the degree of agglomeration of aerosil in the polishing suspension, removal rate, and the quality of the polished sapphire surface under chemical-mechanical polishing (CMP) with the polishing suspension contained surfactants at different pH were determine...
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| Datum: | 2015 |
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| Format: | Artikel |
| Sprache: | English |
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НТК «Інститут монокристалів» НАН України
2015
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| Schriftenreihe: | Functional Materials |
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| Online Zugang: | http://dspace.nbuv.gov.ua/handle/123456789/119359 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 2. — С. 252-257. — Бібліогр.: 13 назв. — англ. |
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irk-123456789-1193592017-06-07T03:03:47Z Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil Vovk, E.A. Technology The conditions for the optimal balance among the degree of agglomeration of aerosil in the polishing suspension, removal rate, and the quality of the polished sapphire surface under chemical-mechanical polishing (CMP) with the polishing suspension contained surfactants at different pH were determined. It was determined that these conditions depend on the crystallographic orientation of the sapphire surface. Surface roughness Ra 0.2-0.4 nm and the optical quality class 20/10-40/20 (USA MIL O 13830) was obtained for orientations (0001), (11-20), and (10-12) by CMP with the polishing suspension contained the surfactant with OH functional groups, and at optimal value of pH for each orientations. 2015 Article Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 2. — С. 252-257. — Бібліогр.: 13 назв. — англ. 1027-5495 DOI: http://dx.doi.org/10.15407/fm22.02.252 http://dspace.nbuv.gov.ua/handle/123456789/119359 en Functional Materials НТК «Інститут монокристалів» НАН України |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| collection |
DSpace DC |
| language |
English |
| topic |
Technology Technology |
| spellingShingle |
Technology Technology Vovk, E.A. Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil Functional Materials |
| description |
The conditions for the optimal balance among the degree of agglomeration of aerosil in the polishing suspension, removal rate, and the quality of the polished sapphire surface under chemical-mechanical polishing (CMP) with the polishing suspension contained surfactants at different pH were determined. It was determined that these conditions depend on the crystallographic orientation of the sapphire surface. Surface roughness Ra 0.2-0.4 nm and the optical quality class 20/10-40/20 (USA MIL O 13830) was obtained for orientations (0001), (11-20), and (10-12) by CMP with the polishing suspension contained the surfactant with OH functional groups, and at optimal value of pH for each orientations. |
| format |
Article |
| author |
Vovk, E.A. |
| author_facet |
Vovk, E.A. |
| author_sort |
Vovk, E.A. |
| title |
Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil |
| title_short |
Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil |
| title_full |
Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil |
| title_fullStr |
Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil |
| title_full_unstemmed |
Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil |
| title_sort |
chemical-mechanical polishing of sapphire by polishing suspension based on aerosil |
| publisher |
НТК «Інститут монокристалів» НАН України |
| publishDate |
2015 |
| topic_facet |
Technology |
| url |
http://dspace.nbuv.gov.ua/handle/123456789/119359 |
| citation_txt |
Chemical-mechanical polishing of sapphire by polishing suspension based on aerosil / E.A.Vovk // Functional Materials. — 2015. — Т. 22, № 2. — С. 252-257. — Бібліогр.: 13 назв. — англ. |
| series |
Functional Materials |
| work_keys_str_mv |
AT vovkea chemicalmechanicalpolishingofsapphirebypolishingsuspensionbasedonaerosil |
| first_indexed |
2025-07-08T15:43:59Z |
| last_indexed |
2025-07-08T15:43:59Z |
| _version_ |
1837094078683021312 |