Features of coatings deposition in combined stationary-pulsed operation mode of the magnetron sputtering system
The results of researches of the combined stationary-pulsed operating mode of longitudinal planar magnetron sputtering system (MSS) with a magnetically isolated anode and with the additional pulsed high-current, high-voltage power supply are presented. It is shown that the increasing of duration of...
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
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irk-123456789-1221622017-06-29T03:02:48Z Features of coatings deposition in combined stationary-pulsed operation mode of the magnetron sputtering system Chunadra, А.G. Sereda, К.N. Tarasov, I.K. Bizukov, А.А. Girka, A.I. Низкотемпературная плазма и плазменные технологии The results of researches of the combined stationary-pulsed operating mode of longitudinal planar magnetron sputtering system (MSS) with a magnetically isolated anode and with the additional pulsed high-current, high-voltage power supply are presented. It is shown that the increasing of duration of the pulse discharge with decaying current and voltage is not advisable for effective intensification of MSS target sputtering process and increase of mass transfer of substance on substrate. The existence of the optimal ratio between parameters of the stationary and pulsed magnetron discharge is shown. Представлены результаты исследований комбинированного стационарно-импульсного режима работы продольной планарной магнетронной распылительной системы (МРС) с магнитоизолированным анодом с дополнительным импульсным сильноточным высоковольтным источником питания. Показано, что для эффективной интенсификации процесса распыления мишени МРС и увеличения массопереноса вещества на подложку нецелесообразно увеличивать длительность импульсного разряда со спадающими импульсными током и напряжением. Показано существование определённого оптимального соотношения между параметрами стационарного и импульсного магнетронных разрядов. Представлено результати досліджень комбінованого стаціонарно-імпульсного режиму роботи повздовжньої планарної магнетронної розпилювальної системи (МРС) з магнітоізольованим анодом з допоміжним імпульсним сильнострумовим високовольтним джерелом живлення. Показано, що для ефективної інтенсифікації процесу розпилення мішені МРС та збільшення масопереносу речовини на підкладку небажано збільшувати тривалість імпульсного розряду зі спадаючими імпульсним струмом та напругою. Показано існування визначеного оптимального співвідношення між параметрами стаціонарного та імпульсного магнетронних розрядів. 2017 Article Features of coatings deposition in combined stationary-pulsed operation mode of the magnetron sputtering system / А.G. Chunadra, К.N. Sereda, I.K. Tarasov, А.А. Bizukov, A.I. Girka // Вопросы атомной науки и техники. — 2017. — № 1. — С. 227-230. — Бібліогр.: 4 назв. — англ. 1562-6016 PACS: 51.50.+v, 52.25.Jm http://dspace.nbuv.gov.ua/handle/123456789/122162 en Вопросы атомной науки и техники Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine |
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Низкотемпературная плазма и плазменные технологии Низкотемпературная плазма и плазменные технологии |
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Низкотемпературная плазма и плазменные технологии Низкотемпературная плазма и плазменные технологии Chunadra, А.G. Sereda, К.N. Tarasov, I.K. Bizukov, А.А. Girka, A.I. Features of coatings deposition in combined stationary-pulsed operation mode of the magnetron sputtering system Вопросы атомной науки и техники |
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The results of researches of the combined stationary-pulsed operating mode of longitudinal planar magnetron sputtering system (MSS) with a magnetically isolated anode and with the additional pulsed high-current, high-voltage power supply are presented. It is shown that the increasing of duration of the pulse discharge with decaying current and voltage is not advisable for effective intensification of MSS target sputtering process and increase of mass transfer of substance on substrate. The existence of the optimal ratio between parameters of the stationary and pulsed magnetron discharge is shown. |
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Article |
| author |
Chunadra, А.G. Sereda, К.N. Tarasov, I.K. Bizukov, А.А. Girka, A.I. |
| author_facet |
Chunadra, А.G. Sereda, К.N. Tarasov, I.K. Bizukov, А.А. Girka, A.I. |
| author_sort |
Chunadra, А.G. |
| title |
Features of coatings deposition in combined stationary-pulsed operation mode of the magnetron sputtering system |
| title_short |
Features of coatings deposition in combined stationary-pulsed operation mode of the magnetron sputtering system |
| title_full |
Features of coatings deposition in combined stationary-pulsed operation mode of the magnetron sputtering system |
| title_fullStr |
Features of coatings deposition in combined stationary-pulsed operation mode of the magnetron sputtering system |
| title_full_unstemmed |
Features of coatings deposition in combined stationary-pulsed operation mode of the magnetron sputtering system |
| title_sort |
features of coatings deposition in combined stationary-pulsed operation mode of the magnetron sputtering system |
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
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2017 |
| topic_facet |
Низкотемпературная плазма и плазменные технологии |
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http://dspace.nbuv.gov.ua/handle/123456789/122162 |
| citation_txt |
Features of coatings deposition in combined stationary-pulsed operation mode of the magnetron sputtering system / А.G. Chunadra, К.N. Sereda, I.K. Tarasov, А.А. Bizukov, A.I. Girka // Вопросы атомной науки и техники. — 2017. — № 1. — С. 227-230. — Бібліогр.: 4 назв. — англ. |
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Вопросы атомной науки и техники |
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2025-07-08T21:16:21Z |
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ISSN 1562-6016. ВАНТ. 2017. №1(107)
PROBLEMS OF ATOMIC SCIENCE AND TECHNOLOGY. 2017, № 1. Series: Plasma Physics (23), p. 227-230. 227
FEATURES OF COATINGS DEPOSITION IN COMBINED
STATIONARY-PULSED OPERATION MODE OF THE MAGNETRON
SPUTTERING SYSTEM
А.G. Chunadra
1
, К.N. Sereda
1
, I.K. Tarasov
1,2
, А.А. Bizukov
1
, A.I. Girka
1
1
V.N. Karazin Kharkiv National University, Kharkov, Ukraine;
2
Institute of Plasma Physics of the NSC KIPT, Kharkov, Ukraine
Email: knsereda@karazin.ua
The results of researches of the combined stationary-pulsed operating mode of longitudinal planar magnetron
sputtering system (MSS) with a magnetically isolated anode and with the additional pulsed high-current, high-
voltage power supply are presented. It is shown that the increasing of duration of the pulse discharge with decaying
current and voltage is not advisable for effective intensification of MSS target sputtering process and increase of
mass transfer of substance on substrate. The existence of the optimal ratio between parameters of the stationary and
pulsed magnetron discharge is shown.
PACS: 51.50.+v, 52.25.Jm
INTRODUCTION
Magnetron sputtering systems (MSS) are widely
used for receiving of thin coating [1]. Technologies of
coatings deposition in MSS allow creating metallic
films for various purposes. Among the all kinds of
pulsed discharges MSS occupy a special place. Pulsed
magnetron sputtering devices attract more and more
attention of specialists not only as a tool for the
deposition of coatings with unique characteristics, but
also as a high-density plasma source. Extremely high
concentration pulsed magnetron plasma discharge
provides opportunities to develop new methods of
surface modification. For realization of these
technologies the experimental study of spatial and
temporal parameters of the discharge and plasma in the
magnetron sputtering system in a pulsed mode should
be carried out.
MSS with a magnetically insulated anode and with
an additional high-current high-voltage pulsed power
supply (PPS) are studies early in [2, 3]. Designed PPS
can operate in different modes of initiation of pulsed
magnetron discharge:
1. Creating of preliminary plasma and filling the
magnetic trap of MSS are realized by means of Bostic
gun. A high voltage is applied to the electrodes of MSS
from a capacity battery and is initiated the single pulsed
discharge. The duration of discharge pulse is defined by
capacity battery.
2. A single pulse of high voltage from the capacitive
battery is applied to the electrodes of MSS on the
background of stationary magnetron discharge. The
pulse duration is determined by capacity of battery.
3. A single pulse of high voltage with fixed duration or
a sequence of such pulses is applied to the electrodes of
MSS on the background stationary magnetron discharge
with a controlled duty cycle.
Researches of MSS worked in the mode of the
combined stationary-pulsed discharge with the full
capacity of PPS (mode 2) showed that the pulsed
discharge of MSS had uniform distributed diffuse
nature, as well as stationary mode [4]. After application
of the pulse of voltage (Uimp = 1.1 kV) on the electrodes
of MSS, current disrupts which is typical for the arc
mode. However, the value of voltage decreased only to
800 V, and further there was a discharge of PPS
capacity storage on active resistance of the discharge
gap during 5…6 ms.
The maximum discharge current value of the pulse
was varied by including the resistance varied in the
range 0.5...2.0 with increment of 0.5 in discharge
circuit. The dependence of copper coating mass on
maximal value of the discharge current was measured. It
has shown that the coating mass is proportional to the
maximum of the discharge current. Mass transfer during
of stationary and pulsed processes increases by three
orders of magnitude in comparison with only stationary
mode of magnetron operating. However, a pulsed
discharge current has a maximum value only at the
initial moment of discharge, and then decreases
exponentially to zero together with voltage, during
5...6 ms. Thus, the processes that determine the
effectiveness of sputtering and target material transfer
on a substrate during the subsequent course of pulsed
discharge remained unexplored.
This paper presents the results of studies of the
combined stationary-pulsed operating mode of
longitudinal planar MSS with magnetically insulated
anode with an additional application to the electrodes a
single pulse of high voltage fixed duration on the
background stationary mode of magnetron discharge.
1. EXPERIMENTAL EQUIPMENT
Experiments were carried out in the installation of
type UVN-71 by using a planar MSS with copper
sputtering target (45×180) mm
2
. The magnetic field of
the arched configuration above the surface of target was
created by means of the permanent magnets. Working
pressure in the installation’s chamber was provided by
the continuous inlet of working gas (argon) in the range
of pressures (1…8) 10
3
Torr directly in the area of
discharge. The pulsed power module of capacity type
mailto:knsereda@karazin.ua
228 ISSN 1562-6016. ВАНТ. 2017. №1(107)
with a thyristor switchboard provided application of
single voltage (1.5 kV) pulse on the cathode-anode
interval.
In the experiments the deposition of copper coatings
was produced on a subject glasses during 90 s of
stationary magnetron discharge with the parameters of
Up = 350 V, Ip = 0.5 A at pressure of argon of
P = (2…5) 10
3
Torr. Single-pulse voltage value of
Upulse = 1.1 kV and duration imp = 1, 2, 3, 4 or 5 ms was
put between a cathode and anode of MSS on a
background stationary voltage of burning of magnetron
discharge. The pulse of voltage with fixed duration was
formed by the guided force pinch-off and lock of
capacity on the equivalent of loading. Using of voltage
pulses with greater duration is not correct due to
maximal duration of discharge defined by capacitor
battery amount 5 ms.
Current of pulsed discharge is measured by means of
Rogovsky coil. The received values have achieved of
Iimp = 6…7 A and exponentially fell during of pulse. The
oscillogram of floating potential of isolated substrate
holder was also monitored for control of processing of
subject glasses. Average current was calculated from the
received oscillograms on the base of 10 points during
pulse.
Determination of efficiency of mass transfer of
copper was produced by the method of weighing of
subject glasses with the deposited coatings on analytical
scales. Weighing results allowed to define mass transfer
of copper on unit of area of subject glasses during an
pulse ( (g·cm
-2
)), and also stream of mass of the copper
deposited during an pulse (j(g·s
-1
·cm
-2
)).
2. RESULTS OF EXPERIMENTS AND
DISCUSSION
Oscillograms of the current (blue curve) of single
pulsed discharge of different duration on a background
of stationary discharge and potential (red curve) of
substrate holder are shown in Figs. 1-4. Those results
were received at different pulse duration ( ), average
current during of pulse (Iav), stream of mass of the
deposited copper during of pulse (j) and mass transfer
during of pulse ( ).
Fig.1. Oscillograms of current of single pulse discharge
on a background a stationary discharge (top) and
potential of substrate holder (bottom) ( = 1 ms,
Iav= 1.4 A, j =0.021 g·s
-1
·cm
-2
, = 0.021 g·cm
-2
)
Fig. 2. Oscillograms of current of single pulse
discharge on a background a stationary discharge (top)
and potential of substrate holder (bottom) ( = 2 ms,
Iav = 0.8 A, j = 0.015 g·s
-1
·cm
-2
, = 0.029 g·cm
-2
)
Fig. 3. Oscillograms of current of single pulse
discharge on a background a stationary discharge (top)
and potential of substrate holder (bottom) ( = 3 ms,
Iav = 0.5 A, j = 0.011 g·s
-1
·cm
-2
, = 0.033 g·cm
-2
)
Waveforms of current of pulsed discharge are
similar to the waveforms of current obtained in the PPS
operation mode 2. At short pulses with duration of
1…3 ms current has non-zero value at the end of pulse.
However, a current achieved of zero at the duration of
pulse of 4 ms due to the capacity of PPS is full run
down. Initial maximal value of current of pulsed
discharge is determined by many factors related to the
processes of pumping, gas inlet, stability and exactness
of the set pressure of working gas in a chamber. Thus it
becomes difficult to control together with other main
parameters of stationary discharge in MSS. The initial
maximum of current pulse was oscillated in a range
Iimp = 6…7 A even with careful repetition of the initial
parameters for the pulsed discharge. Therefore, in the
experiments we did not attempt to maximize absolute
repetition of the initial pulse current, but its value is
taken into account when determining the average pulse
current.
The oscillograms of floating potential of substrate
holder are similar regardless of pulse duration. In initial
moment of pulse of voltage the substrate holder has
ISSN 1562-6016. ВАНТ. 2017. №1(107) 229
potential Usub = +(10…20) V, and through 200…300 s
potential of substrate holder becomes negative
Usub = –10 V and saved to such during all pulse of
voltage.
Dependences of average current during of pulse
(I (А)), flow of mass of the deposited copper are brought
during an pulse (j(g·s
-1
·cm
-2
)) and mass transfer during
an pulse ( (g·cm
-2
)) from a pulse duration τ are shown
in Fig. 5 .
Fig. 4. Oscillograms of current of single pulse
discharge on a background a stationary discharge (top)
and potential of substrate holder (bottom) ( = 4 ms,
Iav = 0.45 A, j = 0.008 g·s
-1
·cm
-2
, = 0.032 g·cm
-2
)
Fig. 5. Dependencies of average current (I (А)), flow of
mass of the deposited copper (j(g·s
-1
·cm
-2
)) and mass
transfer ( (g·cm
-2
)) during of pulse from the pulse
duration τ
Average current of pulse with the pulse duration
from imp = 1 ms to imp = 5 ms reduces approximately in
5 times. At the duration of pulse more than 4…5 ms,
current goes out on a satiation, that it is caused the
slump of pulsed current at such durations to a zero
value.
Dependence of flow of the deposited copper mass
(j(g·s
-1
·cm
-2
)) on a pulse duration τ behaves like to
dependence of value of average current and with the
height of pulse duration from imp = 1 ms to imp = 5 ms
also diminishes approximately in 5 times.
These results eloquently testify to pointlessness of
increase of PPS capacity for the purpose of increasing
the duration of pulsed discharge with negative-going of
pulsed current and voltage.
Dependence of specific mass transfer for pulse of τ
show more dramatic result to us (Fig. 5). Specific mass
transfer increases at first with the height of pulse
duration, arriving at a maximal value at imp = 3 ms, and
then diminishes substantially.
Such character of dependence of specific mass
transfer from pulse duration testifies not only to
pointlessness of increase of duration of impulsive
discharge with negative-going an impulsive current and
voltage but also about existence of certain optimal
parameters between stationary and impulsive magnetron
discharges.
The obtained results allow supposing that the
process of deposition of coatings is accompanied by
theirs sputtering by the ions of working gas in the planar
MSS with combined stationary-pulsed mode of
operations. .
CONCLUSIONS
Features of the combined stationary-pulsed
operating mode of longitudinal planar MSS with
magnetically insulated anode with an additional
application of a single pulse of high voltage with fixed
duration have been studied.
Increase the duration of the pulsed discharge is an
inadvisable for intensification of process of target
sputtering and increases of mass transfer on substrate in
MSS.
It is shown the existence of the optimal ratio
between the parameters of stationary and pulsed parts of
magnetron discharge. At the same time, the increase of
maximum of initial current of pulsed discharge lead to
improve of efficiency of MMS.
REFERENCES
1. A.I. Kuzmichov. Magnetron sputtering system. Kiev:
“Avers”, 2008.
2. A.A. Bizyukov, O.I. Girka, K.N. Sereda,
V.V. Sleptsov, A.G. Chunadra. Control of planar
magnetron sputtering system operating modes by
additional anode magnetic field // Problems of Atomic
Science and Technology. Series "Plasma Physics".
2010, № 6 (16), p. 144-146.
3. A.A. Bizyukov, K.N. Sereda, V.V. Sleptsov,
I.K. Tarasov, A.G. Chunadra. Pulsed magnetron
sputtering system power supply without limitation and
forced interruption of the discharge current // Problems
of Atomic Science and Technology. Series “Plasma
Physics”. 2013, v.83 , № 1 (19), 2013, p. 225-227.
4. A.G. Chunadra, K.N. Sereda, I.K. Tarasov,
A.A. Bizyukov. Increasing of mass transfer efficiency at
magnetron deposition of metal coating // Problems of
Atomic Science and Technology. Series “Plasma
Physics”. 2015, v. 95, №1 (21), p. 181-183.
Article received 28.12.16
230 ISSN 1562-6016. ВАНТ. 2017. №1(107)
ОСОБЕННОСТИ ОСАЖДЕНИЯ ПОКРЫТИЙ ПРИ КОМБИНИРОВАННОМ
СТАЦИОНАРНО-ИМПУЛЬСНОМ РЕЖИМЕ РАБОТЫ МАГНЕТРОННОЙ РАСПЫЛИТЕЛЬНОЙ
СИСТЕМЫ
А.Г. Чунадра, К.Н. Середа, И.К. Тарасов, А.А. Бизюков, А.И. Гирка
Представлены результаты исследований комбинированного стационарно-импульсного режима работы
продольной планарной магнетронной распылительной системы (МРС) с магнитоизолированным анодом с
дополнительным импульсным сильноточным высоковольтным источником питания. Показано, что для
эффективной интенсификации процесса распыления мишени МРС и увеличения массопереноса вещества на
подложку нецелесообразно увеличивать длительность импульсного разряда со спадающими импульсными
током и напряжением. Показано существование определённого оптимального соотношения между
параметрами стационарного и импульсного магнетронных разрядов.
ОСОБЛИВОСТІ ОСАДЖЕННЯ ПОКРИТТІВ ПРИ КОМБІНОВАНОМУ
СТАЦІОНАРНО-ІМПУЛЬСНОМУ РЕЖИМІ РОБОТИ МАГНЕТРОННОЇ РОЗПИЛЮВАЛЬНОЇ
СИСТЕМИ
А.Г. Чунадра, К.М. Середа, І.К. Тарасов, О.А. Бізюков, О.І. Гірка
Представлено результати досліджень комбінованого стаціонарно-імпульсного режиму роботи
повздовжньої планарної магнетронної розпилювальної системи (МРС) з магнітоізольованим анодом з
допоміжним імпульсним сильнострумовим високовольтним джерелом живлення. Показано, що для
ефективної інтенсифікації процесу розпилення мішені МРС та збільшення масопереносу речовини на
підкладку небажано збільшувати тривалість імпульсного розряду зі спадаючими імпульсним струмом та
напругою. Показано існування визначеного оптимального співвідношення між параметрами стаціонарного
та імпульсного магнетронних розрядів.
|