VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate

VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate

Using X-ray reflectometry method, the kinektics of solid state reactions at the surface of layered thin film nickel/Sisub system (effective nickel thickness 15 and 45 nm) under VUV irradiation of 8≤hv≤1.8 eV energy was studied. Nickel and nickel oxide layers have shown no changes both in thickness a...

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Бібліографічні деталі
Дата:2006
Автори: Mikhailov, I.F., Malykhin, S.V., Borisova, S.S., Fomina, L.P.
Формат: Стаття
Мова:English
Опубліковано: НТК «Інститут монокристалів» НАН України 2006
Назва видання:Functional Materials
Онлайн доступ:http://dspace.nbuv.gov.ua/handle/123456789/134056
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate / I.F. Mikhailov, S.V. Malykhin , S.S. Borisova , L.P. Fomina // Functional Materials. — 2006. — Т. 13, № 3. — С. 381-386. — Бібліогр.: 28 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine
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spelling irk-123456789-1340562018-06-12T03:03:50Z VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate Mikhailov, I.F. Malykhin, S.V. Borisova, S.S. Fomina, L.P. Using X-ray reflectometry method, the kinektics of solid state reactions at the surface of layered thin film nickel/Sisub system (effective nickel thickness 15 and 45 nm) under VUV irradiation of 8≤hv≤1.8 eV energy was studied. Nickel and nickel oxide layers have shown no changes both in thickness and sesity. As a result of VUV stimulated silicon diffusion from the substrate and of its reaction with nitrogen, a new layer of silicon nitride with of (3.2...3.4) g*cm⁻³ desity in formed at the nickel film surface. The silicon nitride formation reaction, where nickel acts as a catalyst, is of zero order typical of radiation-(photo)-chemical processes and stops at the layer thickness about 1.5 nm. After aging in air, the surface layer density decreases down to 2.3 g*cm⁻³ and thickness increases to about 25 nm due to oxidation. Repeated cycles of irradiation and oxidation result in degradation of the film-substrate system due to breakink the film adhesion 2006 Article VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate / I.F. Mikhailov, S.V. Malykhin , S.S. Borisova , L.P. Fomina // Functional Materials. — 2006. — Т. 13, № 3. — С. 381-386. — Бібліогр.: 28 назв. — англ. http://dspace.nbuv.gov.ua/handle/123456789/134056 en Functional Materials НТК «Інститут монокристалів» НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description Using X-ray reflectometry method, the kinektics of solid state reactions at the surface of layered thin film nickel/Sisub system (effective nickel thickness 15 and 45 nm) under VUV irradiation of 8≤hv≤1.8 eV energy was studied. Nickel and nickel oxide layers have shown no changes both in thickness and sesity. As a result of VUV stimulated silicon diffusion from the substrate and of its reaction with nitrogen, a new layer of silicon nitride with of (3.2...3.4) g*cm⁻³ desity in formed at the nickel film surface. The silicon nitride formation reaction, where nickel acts as a catalyst, is of zero order typical of radiation-(photo)-chemical processes and stops at the layer thickness about 1.5 nm. After aging in air, the surface layer density decreases down to 2.3 g*cm⁻³ and thickness increases to about 25 nm due to oxidation. Repeated cycles of irradiation and oxidation result in degradation of the film-substrate system due to breakink the film adhesion
format Article
author Mikhailov, I.F.
Malykhin, S.V.
Borisova, S.S.
Fomina, L.P.
spellingShingle Mikhailov, I.F.
Malykhin, S.V.
Borisova, S.S.
Fomina, L.P.
VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate
Functional Materials
author_facet Mikhailov, I.F.
Malykhin, S.V.
Borisova, S.S.
Fomina, L.P.
author_sort Mikhailov, I.F.
title VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate
title_short VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate
title_full VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate
title_fullStr VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate
title_full_unstemmed VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate
title_sort vuv stimulated solid-phase reactions on the surface on ni nano-layers on si substrate
publisher НТК «Інститут монокристалів» НАН України
publishDate 2006
url http://dspace.nbuv.gov.ua/handle/123456789/134056
citation_txt VUV stimulated solid-phase reactions on the surface on Ni nano-layers on Si substrate / I.F. Mikhailov, S.V. Malykhin , S.S. Borisova , L.P. Fomina // Functional Materials. — 2006. — Т. 13, № 3. — С. 381-386. — Бібліогр.: 28 назв. — англ.
series Functional Materials
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first_indexed 2025-07-09T20:13:52Z
last_indexed 2025-07-09T20:13:52Z
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