Ion plasma deposition and optical properties of SiC films
SiC films have been obtained by direct deposition from a C and Si ions flow at energy values in the 30 to 1.500 eV range. The films deposited at the substrate temperature 600 С were chemically and structurally disordered. The deposition energy increase resulted in a reduced optical slot of the film...
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| Datum: | 2005 |
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| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
НТК «Інститут монокристалів» НАН України
2005
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| Schriftenreihe: | Functional Materials |
| Online Zugang: | http://dspace.nbuv.gov.ua/handle/123456789/135335 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Ion plasma deposition and optical properties of SiC films / Sh. Muto, V.M. Puzikov, A.V. Lopin, A.V. Semenov // Functional Materials. — 2005. — Т. 12, № 2. — С. 216-223. — Бібліогр.: 22 назв. — англ. |