Influence of intensive etching processes on structure and properties of carbon nitride films
The influence of electromagnetic radiation and oxygen impurity in the growth atmosphere on the growth processes of nanostructured carbon nitride CNx films has been studied. The oxygen impurity in the gas mixture and an UV irradiation has been found to decrease the thickness and refraction index of c...
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Дата: | 2008 |
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Мова: | English |
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НТК «Інститут монокристалів» НАН України
2008
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Назва видання: | Functional Materials |
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Онлайн доступ: | http://dspace.nbuv.gov.ua/handle/123456789/136548 |
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Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
Цитувати: | Influence of intensive etching processes on structure and properties of carbon nitride films // R.V. Shalaev, V.N. Varyukhin, A.M. Prudnikov, A.I. Linnik, I.V. Zhikharev, N.N. Belousov, D.V. Raspornya, A.N. Ulyanov // Functional Materials. — 2008. — Т. 15, № 4. — С. 580-584. — Бібліогр.: 15 назв. — англ. |
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irk-123456789-1365482018-06-17T03:12:28Z Influence of intensive etching processes on structure and properties of carbon nitride films Shalaev, R.V. Varyukhin, V.N. Prudnikov, A.M. Linnik, A.I. Zhikharev, I.V. Belousov, N.N. Raspornya, D.V. Ulyanov, A.N. Technology The influence of electromagnetic radiation and oxygen impurity in the growth atmosphere on the growth processes of nanostructured carbon nitride CNx films has been studied. The oxygen impurity in the gas mixture and an UV irradiation has been found to decrease the thickness and refraction index of carbon nitride films, while increasing the optical band gap width. The intensive etching processes result in the formation of closepacked columnar film nanostructures of carbon nitride. Подано результати досліджень впливу електромагнітного випромінювання і домішок кисню у ростовій атмосфері на процеси росту наноструктурних плівок нітриду вуглецю CNx. Виявлено, що домішка кисню у газовій суміші і ультрафіолетове опромінювання зменшують товщину і коефіцієнт заломлення плівок нітриду вуглецю, збільшують ширину забороненої зони. Показано, що інтенсивні процеси травлення приводять до утворення щільноупакованих колонарних плівкових наноструктур нітриду вуглецю. Представлены результаты исследований влияния электромагнитного излучения и примесей кислорода в ростовой атмосфере на процессы роста наноструктурных пленок нитрида углерода CNx. Обнаружено, что примесь кислорода в газовой смеси и УФ облучение уменьшают толщину и коэффициент преломления пленок нитрида углерода и увеличивают ширину запрещенной зоны. Интенсивные травящие процессы приводят к образованию плотноупакованных колонарных пленочных наноструктур нитрида углерода. 2008 Article Influence of intensive etching processes on structure and properties of carbon nitride films // R.V. Shalaev, V.N. Varyukhin, A.M. Prudnikov, A.I. Linnik, I.V. Zhikharev, N.N. Belousov, D.V. Raspornya, A.N. Ulyanov // Functional Materials. — 2008. — Т. 15, № 4. — С. 580-584. — Бібліогр.: 15 назв. — англ. 1027-5495 http://dspace.nbuv.gov.ua/handle/123456789/136548 en Functional Materials НТК «Інститут монокристалів» НАН України |
institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
collection |
DSpace DC |
language |
English |
topic |
Technology Technology |
spellingShingle |
Technology Technology Shalaev, R.V. Varyukhin, V.N. Prudnikov, A.M. Linnik, A.I. Zhikharev, I.V. Belousov, N.N. Raspornya, D.V. Ulyanov, A.N. Influence of intensive etching processes on structure and properties of carbon nitride films Functional Materials |
description |
The influence of electromagnetic radiation and oxygen impurity in the growth atmosphere on the growth processes of nanostructured carbon nitride CNx films has been studied. The oxygen impurity in the gas mixture and an UV irradiation has been found to decrease the thickness and refraction index of carbon nitride films, while increasing the optical band gap width. The intensive etching processes result in the formation of closepacked columnar film nanostructures of carbon nitride. |
format |
Article |
author |
Shalaev, R.V. Varyukhin, V.N. Prudnikov, A.M. Linnik, A.I. Zhikharev, I.V. Belousov, N.N. Raspornya, D.V. Ulyanov, A.N. |
author_facet |
Shalaev, R.V. Varyukhin, V.N. Prudnikov, A.M. Linnik, A.I. Zhikharev, I.V. Belousov, N.N. Raspornya, D.V. Ulyanov, A.N. |
author_sort |
Shalaev, R.V. |
title |
Influence of intensive etching processes on structure and properties of carbon nitride films |
title_short |
Influence of intensive etching processes on structure and properties of carbon nitride films |
title_full |
Influence of intensive etching processes on structure and properties of carbon nitride films |
title_fullStr |
Influence of intensive etching processes on structure and properties of carbon nitride films |
title_full_unstemmed |
Influence of intensive etching processes on structure and properties of carbon nitride films |
title_sort |
influence of intensive etching processes on structure and properties of carbon nitride films |
publisher |
НТК «Інститут монокристалів» НАН України |
publishDate |
2008 |
topic_facet |
Technology |
url |
http://dspace.nbuv.gov.ua/handle/123456789/136548 |
citation_txt |
Influence of intensive etching processes on structure and properties of carbon nitride films // R.V. Shalaev, V.N. Varyukhin, A.M. Prudnikov, A.I. Linnik, I.V. Zhikharev, N.N. Belousov, D.V. Raspornya, A.N. Ulyanov // Functional Materials. — 2008. — Т. 15, № 4. — С. 580-584. — Бібліогр.: 15 назв. — англ. |
series |
Functional Materials |
work_keys_str_mv |
AT shalaevrv influenceofintensiveetchingprocessesonstructureandpropertiesofcarbonnitridefilms AT varyukhinvn influenceofintensiveetchingprocessesonstructureandpropertiesofcarbonnitridefilms AT prudnikovam influenceofintensiveetchingprocessesonstructureandpropertiesofcarbonnitridefilms AT linnikai influenceofintensiveetchingprocessesonstructureandpropertiesofcarbonnitridefilms AT zhikhareviv influenceofintensiveetchingprocessesonstructureandpropertiesofcarbonnitridefilms AT belousovnn influenceofintensiveetchingprocessesonstructureandpropertiesofcarbonnitridefilms AT raspornyadv influenceofintensiveetchingprocessesonstructureandpropertiesofcarbonnitridefilms AT ulyanovan influenceofintensiveetchingprocessesonstructureandpropertiesofcarbonnitridefilms |
first_indexed |
2025-07-10T01:37:30Z |
last_indexed |
2025-07-10T01:37:30Z |
_version_ |
1837222017238040576 |
fulltext |
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