Synthesis of charged silica films of porous structure
A new technique has been proposed to obtain thin charged dielectric silica films with porous structure on a Si surface. The film composition and charge state of the dielectric/semiconductor system obtained have been studied. Thickness and porosity degree of the synthesized films have been estimated....
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| Datum: | 2008 |
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| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
НТК «Інститут монокристалів» НАН України
2008
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| Schriftenreihe: | Functional Materials |
| Schlagworte: | |
| Online Zugang: | http://dspace.nbuv.gov.ua/handle/123456789/137233 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Synthesis of charged silica films of porous structure / Yu.S. Zharkikh, S.V. Lysochenko, O.A. Pylypenko, O.V. Tretyak // Functional Materials. — 2008. — Т. 15, № 1. — С. 127-130. — Бібліогр.: 10 назв. — англ. |