Features of surface modification of copper-based alloys under powerful plasma exposures

Paper presents features of plasma alloying of Cu-based materials with Ti-Cr, Ti-Cr-Ti-Nb, Ti-Cr-Ti-Zr, Ti-Cr-TiZrO coatings in different regimes of the QSPA Kh-50. Targets were made from copper samples covered of multilayer PVD coatings have been deposited within a Bulat-type facility. Prepared tar...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Datum:2018
Hauptverfasser: Byrka, O., Aksenov, N., Chunadra, A., Fomina, L., Herashchenko, S., Makhlai, V., Malykhin, S., Sereda, K., Surovitskiy, S., Garkusha, I.
Format: Artikel
Sprache:English
Veröffentlicht: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2018
Schriftenreihe:Вопросы атомной науки и техники
Schlagworte:
Online Zugang:http://dspace.nbuv.gov.ua/handle/123456789/148861
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Features of surface modification of copper-based alloys under powerful plasma exposures / O. Byrka, N. Aksenov, A. Chunadra, L. Fomina, S. Herashchenko, V. Makhlai, S. Malykhin, K. Sereda, S. Surovitskiy, I. Garkusha // Вопросы атомной науки и техники. — 2018. — № 6. — С. 143-146. — Бібліогр.: 12 назв. — англ.

Institution

Digital Library of Periodicals of National Academy of Sciences of Ukraine
Beschreibung
Zusammenfassung:Paper presents features of plasma alloying of Cu-based materials with Ti-Cr, Ti-Cr-Ti-Nb, Ti-Cr-Ti-Zr, Ti-Cr-TiZrO coatings in different regimes of the QSPA Kh-50. Targets were made from copper samples covered of multilayer PVD coatings have been deposited within a Bulat-type facility. Prepared targets were irradiated with powerful plasma streams with energy loads achieved 0.6 MJ/m2 and the pulse duration of 0.25 ms. Influence of plasma impacts on modification different copper alloys has been analyzed. Mechanisms of modification of thin multilayered coatings mixed with Сu substrate in a liquid phase under the plasma processing are evaluated.