Numerical simulation of plateau formation by an electron bunch on the distribution of an accelerating wakefield in a plasma
Over the past decade the production of multi-gigaelectrons from laser-driven and electron-bunch-driven plasma accelerators has been successfully demonstrated. However, applications require improvements of accelerated bunch size and its energy spread. One promising candidate to satisfy these requirem...
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| Date: | 2020 |
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| Main Authors: | , , , , , |
| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2020
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| Series: | Вопросы атомной науки и техники |
| Subjects: | |
| Online Access: | http://dspace.nbuv.gov.ua/handle/123456789/194641 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Numerical simulation of plateau formation by an electron bunch on the distribution of an accelerating wakefield in a plasma / V.I. Maslov, R.T. Ovsiannikov, N. Delerue, V. Kubytskyi, I.P. Levchuk, I.N. Onishchenko // Problems of atomic science and tecnology. — 2020. — № 6. — С. 47-49. — Бібліогр.: 22 назв. — англ. |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine| Summary: | Over the past decade the production of multi-gigaelectrons from laser-driven and electron-bunch-driven plasma accelerators has been successfully demonstrated. However, applications require improvements of accelerated bunch size and its energy spread. One promising candidate to satisfy these requirements is to externally inject an electron bunch into an electron-bunch-driven plasma accelerator. We present studies on the optimization of the self-consistent distribution of an accelerating wakefield of plateau type, which can lead to improvement of final quality of the externally injected and accelerated electron bunch, using simulations with the particle-in-cell code LCODE. We quantified the effect of the injected bunch density on the plateau formation in the blowout regime. |
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