Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage
The paper presents the results of the study on the influence of a high substrate bias voltage from 300 up to 1300 V on the titanium nitride coating deposition under nitrogen pressure of 2 Pa. The deposition rate, phase and chemical composition, adhesion and mechanical properties of coatings, macropa...
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2019
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| Цитувати: | Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage / A.S. Kuprin, S.A. Leonov, V.D. Ovcharenko, E.N. Reshetnyak, V.A. Belous, R.L. Vasilenko, G.N. Tolmachova, V.I. Kovalenko, I.O. Klimenko // Problems of atomic science and technology. — 2019. — № 5. — С. 154-160. — Бібліогр.: 29 назв. — англ. |
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irk-123456789-1952162023-12-03T17:30:52Z Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage Kuprin, A.S. Leonov, S.A. Ovcharenko, V.D. Reshetnyak, E.N. Belous, V.A. Vasilenko, R.L. Tolmachova, G.N. Kovalenko, V.I. Klimenko, I.O. Physics of radiotechnology and ion-plasma technologies The paper presents the results of the study on the influence of a high substrate bias voltage from 300 up to 1300 V on the titanium nitride coating deposition under nitrogen pressure of 2 Pa. The deposition rate, phase and chemical composition, adhesion and mechanical properties of coatings, macroparticle number and size distribution were investigated. Представлені результати дослідження впливу високої напруги зсуву підкладки від 300 до 1300 В на осадження покриттів нітриду титану при тиску азоту 2 Па. Вивчені швидкість осадження, фазовий і хімічний склад, адгезія і механічні властивості покриттів, кількість і розподіл за розмірами макрочасток. Представлены результаты исследования влияния высокого напряжения смещения подложки от 300 до 1300 В на осаждение покрытий нитрида титана при давлении азота 2 Па. Изучены скорость осаждения, фазовый и химический составы, адгезия и механические свойства покрытий, количество и распределение по размерам макрочастиц. 2019 Article Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage / A.S. Kuprin, S.A. Leonov, V.D. Ovcharenko, E.N. Reshetnyak, V.A. Belous, R.L. Vasilenko, G.N. Tolmachova, V.I. Kovalenko, I.O. Klimenko // Problems of atomic science and technology. — 2019. — № 5. — С. 154-160. — Бібліогр.: 29 назв. — англ. 1562-6016 http://dspace.nbuv.gov.ua/handle/123456789/195216 669.056.9 en Вопросы атомной науки и техники Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
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DSpace DC |
| language |
English |
| topic |
Physics of radiotechnology and ion-plasma technologies Physics of radiotechnology and ion-plasma technologies |
| spellingShingle |
Physics of radiotechnology and ion-plasma technologies Physics of radiotechnology and ion-plasma technologies Kuprin, A.S. Leonov, S.A. Ovcharenko, V.D. Reshetnyak, E.N. Belous, V.A. Vasilenko, R.L. Tolmachova, G.N. Kovalenko, V.I. Klimenko, I.O. Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage Вопросы атомной науки и техники |
| description |
The paper presents the results of the study on the influence of a high substrate bias voltage from 300 up to 1300 V on the titanium nitride coating deposition under nitrogen pressure of 2 Pa. The deposition rate, phase and chemical composition, adhesion and mechanical properties of coatings, macroparticle number and size distribution were investigated. |
| format |
Article |
| author |
Kuprin, A.S. Leonov, S.A. Ovcharenko, V.D. Reshetnyak, E.N. Belous, V.A. Vasilenko, R.L. Tolmachova, G.N. Kovalenko, V.I. Klimenko, I.O. |
| author_facet |
Kuprin, A.S. Leonov, S.A. Ovcharenko, V.D. Reshetnyak, E.N. Belous, V.A. Vasilenko, R.L. Tolmachova, G.N. Kovalenko, V.I. Klimenko, I.O. |
| author_sort |
Kuprin, A.S. |
| title |
Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage |
| title_short |
Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage |
| title_full |
Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage |
| title_fullStr |
Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage |
| title_full_unstemmed |
Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage |
| title_sort |
deposition of tin-based coatings using vacuum arc plasma in increased negative substrate bias voltage |
| publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| publishDate |
2019 |
| topic_facet |
Physics of radiotechnology and ion-plasma technologies |
| url |
http://dspace.nbuv.gov.ua/handle/123456789/195216 |
| citation_txt |
Deposition of TiN-based coatings using vacuum arc plasma in increased negative substrate bias voltage / A.S. Kuprin, S.A. Leonov, V.D. Ovcharenko, E.N. Reshetnyak, V.A. Belous, R.L. Vasilenko, G.N. Tolmachova, V.I. Kovalenko, I.O. Klimenko // Problems of atomic science and technology. — 2019. — № 5. — С. 154-160. — Бібліогр.: 29 назв. — англ. |
| series |
Вопросы атомной науки и техники |
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2025-07-16T23:04:55Z |
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2025-07-16T23:04:55Z |
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1837846596163731456 |
| fulltext |
ISSN 1562-6016. PASТ. 2019. №5(123), p. 154-160.
UDС 669.056.9
DEPOSITION OF TiN-BASED COATINGS USING VACUUM ARC
PLASMA IN INCREASED NEGATIVE SUBSTRATE BIAS VOLTAGE
A.S. Kuprin, S.A. Leonov, V.D. Ovcharenko, E.N. Reshetnyak, V.A. Belous, R.L. Vasilenko,
G.N. Tolmachova, V.I. Kovalenko, I.O. Klimenko
National Science Center “Kharkov Institute of Physics and Technology”,
Kharkiv, Ukraine
E-mail: kuprin@kipt.kharkov.ua
The paper presents the results of the study on the influence of a high substrate bias voltage from 300 up to
1300 V on the titanium nitride coating deposition under nitrogen pressure of 2 Pa. The deposition rate, phase and
chemical composition, adhesion and mechanical properties of coatings, macroparticle number and size distribution
were investigated.
INTRODUCTION
Titanium alloys are widely used in mechanical
engineering and medicine as structural materials due to
a complex of physical-mechanical properties: low
density, high strength and corrosion resistance [1]. An
essential disadvantage of these alloys is their rather low
hardness that specifies insufficient wear resistance.
Deposition of hard coatings, based on nitride or carbide
of transition metals, on the surface of titanium-alloys
can provide their use under conditions of heavy
abrasion, erosion and cavitation wear [2, 3].
A vacuum arc method allows for obtaining a wide
range of coatings possessing high protective properties
at rather low temperatures ≤ 500 °С with a high
deposition rate [4]. However, a known disadvantage of
this method is the presence in the vacuum arc plasma of
cathode material droplets (macroparticles) having the
sizes from 0.1 to 40 µm which fall into the coatings and
can exert influence on their protective properties.
Macroparticles impair the homogeneity of coatings and
increase their roughness, decrease wear resistance, in
particular, erosion and corrosion resistance. Application
of magnetic filters for plasma filtering from
macroparticles [5] in most cases is not suitable, as the
coating synthesis efficiency may be significantly
decreased [6].
The sizes and number of macroparticles depend on
the thermophysical and mechanical properties of
cathode material and its temperature, discharge current
type (direct or pulse), cathode spot speed, gas type and
pressure etc. [7]. All these factors are often interrelated.
By the example of cathodes made from Ti, Zr, and Ti-
Al alloys, which form high-melting nitrides, it has been
found that the increasing nitrogen pressure in the
deposition chamber to > 0.5 Pa leads to the sharp
decrease of the number of macroparticles that is due to
the formation a thin nitride layer on the cathode surface
[8, 9]. References [10–12] show a possibility of
producing TiN, ZrN, and CrN coatings with a low
content of macroparticles and high mechanical
properties on the fixed substrates under nitrogen
pressure of ≥ 2 Pa.
Another deposition parameter, which may have an
effect on the number and size of droplets in the
coatings, is the bias voltage on the substrate in the
process of deposition. The application of a direct bias
voltage of -1000 V leads to 3–4 fold decrease in the
macroparticle number in Ti, Zr, Cr, and Cu metal
coatings, as compared to the floating voltage [13]. The
application of a pulse bias voltage (2 kV amplitude,
30 Hz frequency, 25 μs duration) on the substrate also
decreases the number of macroparticles by a factor of 3
for titanium plasma [14]. In the case of TiN coatings the
bias voltage increasing from 0 to -500 V leads to the
significant decreasing in macroparticle number and
surface roughness [15, 16]. The authors of [17] have
found that in the CrN coatings, formed under nitrogen
pressure of about 3 Pa, the number of macroparticles
and roughness are decreasing in 2 times when the bias
voltage increases from -70 to -300 V. The decrease of a
number of macroparticles in the coatings can occur
already on the sample surface as a result of ion
sputtering and electrostatic ion repulsion from the
surface if macroparticles are negatively charged.
Theoretical calculations of the macroparticle motion in
the vacuum arc discharge plasma show that the
electrostatic macroparticle repulsion should increase
with nitrogen pressure increasing to 1.4 Pa [18].
However, the systematic experimental investigations of
the voltage influence on the structure and properties of
nitride coatings deposited under increased nitrogen
pressure in the chamber have not been carried out.
The purpose of this work was to study the influence
of a high negative bias voltage within the range from
300 to 1300 V on the surface morphology, structure,
adhesion and mechanical properties of vacuumarc TiN
coatings deposited under nitrogen pressure of 2 Pa on
the Ti-6Al-4V samples.
1. EXPERIMENTAL TECHNIQUE
Vacuum arc TiN coatings were deposited using the
“Bulat” facility from the plasma source with magnetic
cathode spot confinement and a focusing coil [10]. Pure
titanium (99.9%) was used as cathode material. The arc
discharge current was 60 A. After reaching the initial
pressure ~ 1∙10
-3
Pа in the vacuum chamber, the sample
surface was cleaned by titanium plasma sputtering for
3 min at a negative voltage of -1300 V. The coatings
were deposited under nitrogen pressure ~ 2 Pa for
60 min. The negative bias voltage on the samples was
changing from -300 to 1300 V. The substrate
temperature was maintained at a level of ~ 450 °С.
Coatings were formed on the polished Ti-6Al-4V
samples in the form of disks of 20 mm diameter and
3 mm thickness being rotating in the chamber center at a
distance of 350 mm from the cathode with a speed of 9
revolutions per minute.
The thickness of deposited coatings was measured
using an interferential microscope MII-4 by the
“shadow knife” method. The coating surface
morphology was studied on the scanning electron
microscope JSM 7001-F, and the chemical composition
was determined using EDX (energy-dispersion X-ray
spectroscopy, Oxford Link ISIS 300) at 20 kV.
The phase composition and substructure of coatings
were investigated by the X-ray structural analysis with a
diffractometer DRON-3 in the copper radiation using a
selectively absorbing Ni filter (λCu-Kα = 0.154178 nm).
The XRD measurements were carried out in the θ-2θ
configuration. The size of nitride crystallites (coherent
scattering zones) was calculated with diffraction
maximum extension by the Sherrer formula. The
coating texture analysis was performed by calculating
the texture coefficients for the first three repulsion of
TiN: (111), (200), and (220). The texture coefficients
were calculated using the relationship given in [19]:
( ) ( ) ( ) ( )
0 0/ / /hkl hkl hkl hkl
C m mT nI I I I ,
where Im
(hkl)
is the measured integral intensity of (hkl)
repulsion; I0
(hkl)
is the relative intensity of (hkl) repulsion
for the powder nontextured material; n is the number of
repulsions under consideration being 3 in this
calculation. The internal stresses in the coating were
determined using the X-ray strain metering technique by
the sin
2
ψ method, modified for the textured samples.
The stresses were calculated with the help of a-sin
2
ψ
graphs as a biaxial symmetric state approximation
[20, 21].
The coating adhesion was investigated with a
Rockwell-C hardness test by a diamond indenter under a
load of 150 kg. The mechanical coating properties
(nanohardness and Young modulus) were studied by the
nanoindentation method using a device Nanoindenter
G200 (Agilent Technologies, USA) with a device for
continuous sfiffness measurement (CSM) [22] at a
~ 200 nm indentation depth using a diamond Berkovich
pyramide.
The coating resistance to the abrasion wear was
determined by measuring the mass loss of the sample,
having the disc on its surface rotating with the speed of
2790 rev/min under a load of 100 g. The cavitation
damage of coatings in the distilled water was
investigated using the device described in [23].
2. RESULTS AND DISCUSSION
All deposited coatings were of a saturated gold color
peculiar to TiN mononitride having the nitride content
close to the stoichiometric composition. The curves for
the deposition rate and elemental composition of
coatings as a function of the bias voltage on the samples
are presented in Fig. 1,a,b.
Fig. 1. Deposition rate (a) and elemental
composition (b) of TiN coatings as a function
of the negative substrate bias voltage
As the negative voltage increases from -300 to
-1300 V the coating deposition rate decreases from 3.6
to 2 µm/h (see Fig. 1,a), and the composition changes
from stoichiomertic for TiN phase 50 to 40 at.% of
nitrogen content (see Fig. 1,b). This is the result of
selective sputtering of a lighter element (nitrogen) in the
coatings which enhances with the impinging ion energy
increase. Then the nitrogen content decrease in coatings
occurs at voltages > 600 V.
The TiN coating surface morphology images
obtained at different substrate bias voltages are shown
in Fig. 2. One can see on the sample surface a little
amount of uniformly distributed 3.5 µm macroparticles
and their number slightly changes with the bias voltage
increasing.
a
b
Fig. 2. SEM images of the surface
morphology of coatings deposited at
different negative bias voltages
(x1000), in the insets the surface
fragments with magnification of
x10000 are shown
The surface density of macroparticles and their size
distribution, determined by processing microscope
images, is shown in Fig. 3,a,b.
Fig. 3. Surface density of macroparticles (a) and their
size distribution (b) in the TiN coatings as a function of
the bias voltage
The size of the major part of macroparticles in the
coatings (about 90 %) does not exceed 1.2 µm. As the
voltage increases the macroparticle density is changing
nonmonotonically: from -300 to -600 V it is almost
unchanging, from -600 to -1000 V it increases sharply,
and at -1300 V it slightly decreases as a result of
sputtering and fragmentation due to the high ion energy.
The major part of macroparticles with a size of
> 1.2 µm take place on the surface of coatings deposited
at voltages of -800 and -1000 V. So, the sample voltage
increase above -300 V does not lead to the
macroparticle surface density decrease and even causes
the macroparticle surface density increase and
macroparticle size redistribution. The macroparticle
number increase with negative voltage bias increasing
> 600 V in the TiN coatings can be related to the fact
that a part of macroparticles have a high positive charge
due to the thermoelectronic surface emission [24]. Thus,
the higher negative bias voltage on the substrate, the
larger is the number of macroparticles is attracted to the
surface of coating.
According to the results of X-ray diffraction
analysis, in all the coatings a single crystallite phase,
namely, TiN nitride with a cubic structure of NaCl type,
is formed. The X-ray diffraction patterns of synthesized
coatings are shown in Fig. 4.
Fig. 4. Diffraction patterns for the TiN coatings
deposited at different bias voltages. (Dashed lines show
the TiN peak positions given in the diffraction data base
of JCPDS No 38-1420)
a
b
The ratio of the diffraction nitride peak intensities in
the diffraction patterns deviates from the values given in
the powder diffraction data base of the International
Center for Diffraction Data (JCPDS No 38-1420), and
the position of maxima is slightly displaced towards the
smaller angles, that is promoted by the presence of
texture and compressive stress in the coatings. The
substrate bias voltage increase leads to the change in the
ratio of diffraction line intensities that evidences on the
change in the preferred orientation of nitride crystallites.
The calculated texture coefficients are presented in
Fig. 5,a. When the bias voltage equals to -300 V in the
coatings the orientation of crystallites with (111) plane
parallel to the substrate surface is dominant and a strong
axial texture with [111] axis in the surface normal
direction is formed.
The rocking curve of reflection (111) indicates that
the scattering angle of the texture is 10 degrees.
Fig. 5. Effect of the bias voltage on the texture (a) and
the level of compressive stress (b) in the TiN coatings
The texture coefficient of (111) scattering decreases
and that of (220) increases with the bias voltage
increasing. This is due to the gradual change of the
texture axis to [110] which is observed in the samples
deposited at bias voltage of ≥ 800 V. The nitride
crystallite size practically is independent on the bias
voltage and equals to ~ 20 nm.
By the X-ray strain metering technique in all the
coatings found were high compressive stresses (see Fig.
5,b). When the bias voltage increases from -300 to
-1000 V the stresses are increasing within the range of
7…10 GPa and they decrease to 8 GPa with voltage
increasing to -1300 V.
Such changes in the texture and stress state of the
ion-plasma coatings as a result of substrate bias voltage
increase are related, first of all, with the change in the
energy of coating particles. The vacuum-arc generated
of metal ions with energy includes their initial energy Е0
and the energy get from the Debye layer near the
substrate when a negative bias voltage is applied to it
[6]:
Е = Е0 + еZU,
where Z is the multiplicity of ion charge; U is the
substrate voltage; е is the elementary charge.
In the case of a relatively low ion energy the nitride
coatings, having a cubic structure, the preferred
orientation (111) is formed and the stresses increase
with energy increasing. Usually, the peak of
compressive stresses in TiN coatings is within the range
of average Ti
+
ion energy from 100 to 200 eV.
Subsequent ion energy increase provides the conditions
which lead to the stress relaxation and preferred
orientation (111) change by (200) or (220) [25]. A
major ion component in the titanium arc plasma are ions
of Ti
+2
(about 67%) and Ti
+1
(about 27%) [6]. As the
nitrogen pressure and/or distance from cathode to
substrate increases, the charge and energy of plasma
particles is changing due to the ion scattering on the gas
target and charge exchange of multicharged titanium
ions that leads to the decrease of the average charge and
energy of ions [27, 28]. In the case of nitrogen pressure
2 Pa and distance from cathode to substrate 200 mm the
stress peak for TiN coatings is observed at substrate bias
voltage about 100 V [26]. In this work, the distance
reaches 350 mm. The maximum of stress is shifted
towards higher voltages up to 800 V (see Fig. 5,b),
significant decrease of stresses after reaching a
maximum is not observed and they are remaining at a
rather high level. So in this case the bias voltage range
from -600 to -800 V is critical with regard to the coating
composition and structure formation. In this interval of
bias voltage the nitrogen content in coatings decreases,
surface density of macroparticles and their average size
increase, the texture axis changes from [111] to [110]
and maximum residual stresses are formed.
Fig. 6 presents the images of the coated sample
surface after Rockwell hardness tests, and Fig. 7 shows
the nanoindentation results.
The Rockwell C indenter impressions do not lead to
the spalling of coatings but they are deformed together
with the substrate that evidences on the sufficiently high
level of adhesion. The indentations on the coating
surface have well-defined contours. Along the
indentation edges circular and radial cracks take place.
The best adhesion is observed for the coating deposited
at voltage of -300 V having the highest hardness of
35 GPa and the Young modulus of 450 GPa and the
lowest level of residual stresses of 7 GPa. When the bias
voltage increases the number and sizes of cracks are
increasing, i.e. the coating-substrate adhesion becomes
worse that can be related with internal stress increase.
The voltage increase to -1300 V results in the decrease
of the coating hardness and Young modulus to 18 and
350 GPa respectively.
a
b
Fig. 6. SЕМ images of Rockwell C
indenter impressions in the TiN
coatings deposited at different bias
voltages on the Ti-6Al-4V samples
Fig. 7. Hardness (H) and Young modulus (E) of TiN
coatings as a function of the substrate bias voltage
The results of abrasion and cavitation tests of TiN
coatings deposited on the Ti-6Al-4V alloy surface at
different bias voltages are given in Table.
Abrasion wear and rate of cavitation wear of TiN
coatings depending on the substrate bias voltage
U, V 300 600 800 1000 1300
Abrasion wear
Δm, mg
0.01 0.02 0.04 0.04 0.04
Cavitation
wear rate
v, μg/h
13.3 60 120 260 1180
The best abrasion and cavitation wear resistance is
demonstrated by the coatings with preferred orientation
(111) deposited at voltage of -300 V. When the bias
voltage increases to -800 V the coasting mass loss
during abrasion tests increases by a factor of 4 and then
remains constant. The cavitation wear rate for TiN
coatings increases exponentially with voltage
increasing. It means that the most dynamic wear is
characteristic for the coatings with preferred orientation
(220) produced at bias voltage ≥ 800 V. Correlation
between the level of stresses and wear resistance of
coatings was not established.
The presented results, showing the voltage influence
on the TiN coating properties, somewhat differ from the
data obtained for the coatings deposited by application
of a high pulse bias voltage on the substrate. As is
shown in [29] the application of a pulse bias voltage of
kHz frequency with the amplitude of 1000…2000 V and
duty factor of 10…15% make it possible to form the
structure with preferred orientation (110) that provides a
significant improvement of the coating resistance
against different-type wears as compared to the coatings
with orientation (111). However, it should be noted that
unlike the constant voltage the pulse voltage amplitude
increase within the range from 0 to 2500 V did not lead
to a considerable change in the deposition rate,
composition and hardness of coatings. Moreover, a high
pulse voltage has provided the decreasing of stresses to
5 GPa. So, we can suppose that the main cause of
deterioration of the wear resistance of TiN coatings,
produced at constant bias voltage of 800 V, is the
hardness decrease caused, mainly, by the nitrogen
content decrease and compressive stress increase.
CONCLUSION
The influence of a high negative bias potential
within the range from 300 to 1300 V on the structure
and properties of vacuum arc TiN coatings, deposited
under nitrogen pressure of 2 Pa onto the samples made
from Ti-6Al-4V alloy is investigated.
It has been established that the bias voltage increase
leads to the nearly two fold decrease of the deposition
rate, nitrogen content decrease from 50 to 40 at.%,
macroparticles surface density increase and
macroparticles size redistribution.
Throughout the range of voltage change a single
crystalline phase TiN nitride is formed, having a cubic
structure of a NaCl type with 20 nm crystallite size and
strong axial texture. As the voltage increases the texture
[111] is changed by [110] and the compressive stresses
in the coatings are changing nonmonotonically within
the range of 7…10 GPa.
The increase of bias voltage above -600 V leads to
the deterioration of the TiN coating mechanical
properties: hardness and Young modulus decrease,
adhesion to the substrate becomes worse and abrasion
and cavitation wear rate increases.
So, a complex of the presented investigations shows
that for deposition of protective TiN coatings in the
nitrogen pressure ~2 Pa it is not expedient to increase
the bias voltage above -300 V.
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Article received 19.07.2019
ОСАЖДЕНИЕ TiN-ПОКРЫТИЙ С ИСПОЛЬЗОВАНИЕМ ВАКУУМНО-ДУГОВОЙ
ПЛАЗМЫ ПРИ ПОВЫШЕННОМ ОТРИЦАТЕЛЬНОМ НАПРЯЖЕНИИ ПОДЛОЖКИ
А.С. Куприн, С.А. Леонов, В.Д. Овчаренко, Е.Н. Решетняк, В.А. Белоус, Р.Л. Василенко,
Г.Н. Толмачева, В.И. Коваленко, И.О. Клименко
Представлены результаты исследования влияния высокого напряжения смещения подложки от 300 до
1300 В на осаждение покрытий нитрида титана при давлении азота 2 Па. Изучены скорость осаждения,
фазовый и химический составы, адгезия и механические свойства покрытий, количество и распределение по
размерам макрочастиц.
ОСАДЖЕННЯ TiN-ПОКРИТТІВ З ВИКОРИСТАННЯМ ВАКУУМНО-ДУГОВОЇ ПЛАЗМИ
ПРИ ПІДВИЩЕНІЙ НЕГАТИВНІЙ НАПРУЗІ ПІДКЛАДКИ
О.С. Купрін, С.О. Леонов, В.Д. Овчаренко, O.М. Решетняк, В.А. Білоус, Р.Л. Василенко,
Г.М. Толмачова, В.І. Коваленко, І.О. Клименко
Представлені результати дослідження впливу високої напруги зсуву підкладки від 300 до 1300 В на
осадження покриттів нітриду титану при тиску азоту 2 Па. Вивчені швидкість осадження, фазовий і
хімічний склад, адгезія і механічні властивості покриттів, кількість і розподіл за розмірами макрочасток.
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