Simulation of plasma wakefield focusing and self-focusing of a short sequence of electron bunches depending on the bunch length, shape and distance between bunches
By using two-dimensional numerical simulation, the ratio between the effects of wakefield focusing and self-focusing during the propagation of a short sequence of electron bunches in plasma has been simulated. Cases of dominant wakefield focusing have been demonstrated. In addition, the collection d...
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| Datum: | 2022 |
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| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2022
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| Schriftenreihe: | Problems of Atomic Science and Technology |
| Schlagworte: | |
| Online Zugang: | http://dspace.nbuv.gov.ua/handle/123456789/195882 |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Simulation of plasma wakefield focusing and self-focusing of a short sequence of electron bunches depending on the bunch length, shape and distance between bunches / ПІБ // Problems of Atomic Science and Technology. — 2022. — № 6. — С. 36-39. — Бібліогр.: 14 назв. — англ. |