Ab initio DFT study of ideal shear strength of polytypes of silicon carbide

Ab initio density functional calculations are performed to investigate the ideal shear deformation of SiC poly types (3C, 2H, 4H, and 6H). The deformation of the cubic and the hexagonal poly types in small strain region can be well represented by the elastic properties of component Si4C-tetrahedrons...

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Дата:2008
Автори: Umeno, Y., Kinoshita, Y., Kitamura, T.
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Мова:English
Опубліковано: Інститут проблем міцності ім. Г.С. Писаренко НАН України 2008
Назва видання:Проблемы прочности
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Цитувати:Ab initio DFT study of ideal shear strength of polytypes of silicon carbide / Y. Umeno, Y. Kinoshita, T. Kitamura // Проблемы прочности. — 2008. — № 1. — С. 8-13. — Бібліогр.: 18 назв. — англ.

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spelling irk-123456789-482382013-08-20T22:04:53Z Ab initio DFT study of ideal shear strength of polytypes of silicon carbide Umeno, Y. Kinoshita, Y. Kitamura, T. Научно-технический раздел Ab initio density functional calculations are performed to investigate the ideal shear deformation of SiC poly types (3C, 2H, 4H, and 6H). The deformation of the cubic and the hexagonal poly types in small strain region can be well represented by the elastic properties of component Si4C-tetrahedrons. The stacking pattern in the polytypes affects strain localization, which is correlated with the generalized stacking fault (GSF) energy profile of each shuffle-set plane, and the ideal shear strength. Compressive hydrostatic stress decreases the ideal shear strength, which is in contrast with the behavior of metals. Выполнены функциональные расчеты ab initio плотности с целью изучения идеальной сдвиговой деформации политипов SiC (3С, 2Н, 4Н, 6Н). Деформирование кубических и гексагональных политапов в области малых деформаций характеризуется упругими свойствами составляющих тетраэдров, Si4C. Характер укладки в политипах оказывает воздействие на локализацию деформаций (что коррелирует с профилем энергии обобщенного дефекта укладки каждой перемещенной плоскости) и идеальную прочность на сдвиг. Сжимающее гидростатическое напряжение снижает идеальную прочность на сдвиг, что отличает поведение этих материалов от металлов. 2008 Article Ab initio DFT study of ideal shear strength of polytypes of silicon carbide / Y. Umeno, Y. Kinoshita, T. Kitamura // Проблемы прочности. — 2008. — № 1. — С. 8-13. — Бібліогр.: 18 назв. — англ. 0556-171X http://dspace.nbuv.gov.ua/handle/123456789/48238 539. 4 en Проблемы прочности Інститут проблем міцності ім. Г.С. Писаренко НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
topic Научно-технический раздел
Научно-технический раздел
spellingShingle Научно-технический раздел
Научно-технический раздел
Umeno, Y.
Kinoshita, Y.
Kitamura, T.
Ab initio DFT study of ideal shear strength of polytypes of silicon carbide
Проблемы прочности
description Ab initio density functional calculations are performed to investigate the ideal shear deformation of SiC poly types (3C, 2H, 4H, and 6H). The deformation of the cubic and the hexagonal poly types in small strain region can be well represented by the elastic properties of component Si4C-tetrahedrons. The stacking pattern in the polytypes affects strain localization, which is correlated with the generalized stacking fault (GSF) energy profile of each shuffle-set plane, and the ideal shear strength. Compressive hydrostatic stress decreases the ideal shear strength, which is in contrast with the behavior of metals.
format Article
author Umeno, Y.
Kinoshita, Y.
Kitamura, T.
author_facet Umeno, Y.
Kinoshita, Y.
Kitamura, T.
author_sort Umeno, Y.
title Ab initio DFT study of ideal shear strength of polytypes of silicon carbide
title_short Ab initio DFT study of ideal shear strength of polytypes of silicon carbide
title_full Ab initio DFT study of ideal shear strength of polytypes of silicon carbide
title_fullStr Ab initio DFT study of ideal shear strength of polytypes of silicon carbide
title_full_unstemmed Ab initio DFT study of ideal shear strength of polytypes of silicon carbide
title_sort ab initio dft study of ideal shear strength of polytypes of silicon carbide
publisher Інститут проблем міцності ім. Г.С. Писаренко НАН України
publishDate 2008
topic_facet Научно-технический раздел
url http://dspace.nbuv.gov.ua/handle/123456789/48238
citation_txt Ab initio DFT study of ideal shear strength of polytypes of silicon carbide / Y. Umeno, Y. Kinoshita, T. Kitamura // Проблемы прочности. — 2008. — № 1. — С. 8-13. — Бібліогр.: 18 назв. — англ.
series Проблемы прочности
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AT kinoshitay abinitiodftstudyofidealshearstrengthofpolytypesofsiliconcarbide
AT kitamurat abinitiodftstudyofidealshearstrengthofpolytypesofsiliconcarbide
first_indexed 2025-07-04T08:32:44Z
last_indexed 2025-07-04T08:32:44Z
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fulltext Scientif ic and Technical Section UDC 539. 4 A b I n it io D F T S tu d y o f I d e a l S h e a r S tr e n g th o f P o ly ty p e s o f S il ic o n C a r b id e Y . U m en o ,1a Y . K in osh ita ,2 b and T . K itam u ra2,c 1 Institute o f Industrial Science, The University of Tokyo, Tokyo, Japan 2 Graduate School o f Engineering, Kyoto University, Kyoto, Japan a umeno@iis.u-tokyo.ac.jp, b yusuke-kinoshita@t02 .mbox.media.kyoto-u.ac.jp, c kitamura@me.kyoto-u.ac.jp Ab initio density functional calculations are performed to investigate the ideal shear deformation o f SiC poly types (3C, 2H, 4H, and 6H). The deformation o f the cubic and the hexagonal poly types in small strain region can be well represented by the elastic properties o f component Si4C- tetrahedrons. The stacking pattern in the polytypes affects strain localization, which is correlated with the generalized stacking fault (GSF) energy profile o f each shuffle-set plane, and the ideal shear strength. Compressive hydrostatic stress decreases the ideal shear strength, which is in contrast with the behavior o f metals. K e y w o rd s : ideal strength, shear deform ation, ab initio sim ulation, silicon carbide. In trod u ction . S ilicon carbide (SiC) p ossesses prominent properties such as high m echanical strength, chem ical stability and large band gap energy, and has been w idely used as thermal and m echanical functional material, electrom agnetic functional material, etc. D etailed investigations in atom istic and electronic level are required for SiC crystals because they have a variety o f polytype structures characterized by stacking sequence [ 1], w hich contributes to their interesting m echanical properties. Thus, w ith the aim to elucidate its m echanical deform ation behavior, not on ly experim ental studies but also theoretical approach such as atom istic m odeling have been carried out [2]. A b initio (first principles) calculations have also been performed [3 -5 ] to g ive reliable theoretical insights to the m echanical properties o f SiC around the equilibrium state. H ow ever, the investigations o f the m echanical properties around h igh ly strained conditions are indispensable for understanding o f deform ation behavior o f crystals. A lthough ab initio investigations o f the tensile properties o f 3C (/3)-SiC by L i and W ang [6 ] and o f the shear by Ogata et al. [7] have brought som e interesting results, this issue deserves further studies. In particular, it is important to theoretically evaluate the ultimate strength under ideal shear deform ation o f polytypes, w hich is relevant to the critical shear stress at the onset o f d islocation nucleation from a pristine crystal, to understand the p lasticity in the atom istic scale. M oreover, the response o f the ideal shear strength to com pressive stresses is worth investigating because local lattice configurations m ay receive shear deform ation in com bination w ith normal stresses in experim ents, nam ely nanoindentation. Since the m echanical behavior at atom ic scale is strongly correlated w ith the electronic nature and it is difficult for empirical interatomic potentials to correctly represent various properties aw ay from the equilibrium state, it is important to study the m echanical deform ation by atom istic and electronic m odeling, nam ely the ab initio m ethodology. © Y. U M EN O , Y. K IN O SH ITA , T. K ITA M U R A , 2008 8 ISSN 0556-171X. Проблемы прочности, 2008, № 1 mailto:umeno@iis.u-tokyo.ac.jp mailto:yusuke-kinoshita@t02.mbox.media.kyoto-u.ac.jp mailto:kitamura@me.kyoto-u.ac.jp Ab Initio DFT Study o f Ideal Shear Strength In this study, w e perform ab initio calculations based on the density functional theory (D FT) to investigate the ideal shear deform ation o f SiC polytypes (3C, 2H, 4H, and 6H) w ith the aim to provide fundamental know ledge about the m echanical properties o f the crystals including their behavior under h igh ly sheared strain conditions and the ideal strength, focusing on the effect o f the intrinsic polytype structure on the strain localization and the ideal strength. We further explore the effect o f hydrostatic pressure on the ideal strength. S tru ctu re o f S iC P olytyp es. SiC consists o f tetrahedrons w here vertices are occupied by silicon atom s w ith carbons located in the center o f gravity. The crystal p ossesses various structures (SiC polytypes) w ith different stacking sequence, w hich are denoted in R am sdel’s notation as nX , w here n is the number o f layers along the c-axis per periodic cycle and X is the identifier o f crystal structure (C: Cubic and H: H exagonal). Figure 1 depicts the structures o f 3C, 2H, 4H, and 6H polytypes. In this study, shear deform ation on the c-plane, w hich is ( 111) in cubic structure and (0001 ) in hexagonal, is studied because it is associated w ith an important slip system o f SiC. A s is schem atically delineated in Fig. 2, cubic (3C) and hexagonal (2H , 4H, 6H, ...) crystals have different symmetry in shear deformation due to the stacking structure [8 ]. Concerning shear on the c-plane, 3 C -S iC has three-fold sym m etry resulting in different geom etrical configurations betw een shear deform ations in and its opposite direction([121]). On the other hand, hexagonal polytypes have six-fo ld sym m etry in shear deform ation on (0001 ) plane because their stacking consists o f Si4C-tetrahedrons facing opposite directions. The shear deform ations in a direction and its opposite (e.g ., [0 1 1 0] and [0 1 10]) are therefore identical in hexagonal polytypes. [ 101] [in] [2110] [0001] Fig. 1. Schematics o f stacking sequence o f SiC polytypes. S im u lation P rocedure. We performed ab initio DFT calculations based on the projector augm ented w ave (PAW) m ethod w ithin the framework o f generalized gradient approxim ation (G G A ) using the V ienna A b Initio Sim ulation Package VASP [9, 10]. The plane-w ave cu to ff energy w as set to 500 eV and the PW 91-G G A functional [11] was adopted. In the setup the x, y , and z axes are in [ 0 1 1 0]([ 1 2 1 ]), [2 1 1 0 ]( 101), and [0001]([111]), respectively. Shear deform ation under zero and nonzero hydrostatic stress is sim ulated as follow s: A fter finding equilibrium lattice parameters o f undeform ed crystals by energy minimization under the hydrostatic stress o h , shear deformation y zx is applied to each sim ulation ce ll w here atom ic configuration are relaxed until all the forces are b elow 0.005 eV /A and normal strains o f the ce ll are adjusted so that normal stress com ponents are w ithin ± 1 0 0 M Pa from predeterm ined o h . ISSN 0556-171X. npodxeMbi npounocmu, 2008, N 1 9 Y. Umeno, Y. Kinoshita, and T. Kitamura [1010] [1100] 3C Hexagonal Fig. 2. Schematics o f symmetry in shear deformation o f 3C and hexagonal SiC crystals. R esu lts and D iscu ssion . Stress-S tra in R elationship. Figure 3 show s stress-strain relationships o f the cubic and hexagonal polytypes (3C, 2H, 4H, and 6H) obtained by the ab initio calculations. The curve o f 3C differs from those o f the hexagonal polytypes because o f the difference in the stacking structure, w hich is explained in m ore detail in [8 ]. A lthough the stress-strain relations up to y = 0.2 are alm ost identical betw een the hexagonal polytypes, the polytype structure affects the deform ation behavior at higher strains and thus the ideal strength; the m axim um stress o f 2H is the highest and o f 6H the low est. We find nontrivial effect o f the structure o f polytypes on the ideal strength r is; i.e ., r is o f 6H (29.83 GPa) is about 10% low er than that o f 2H (32 .97 GPa). This is ob viously due to the stacking pattern (structure) affecting the m echanical properties, w hich w ill be d iscussed later on. The ideal strength o f 3C -S iC obtained here, 30.3 GPa, com pares w ell w ith the value evaluated by the loca l density approxim ation (L D A ) by Ogata (29.5 GPa [12]). 35 0 0.1 0.2 0.3 0.4 0.5 Shear strain Fig. 3. Stress-strain curves o f SiC polytypes. The ideal (theoretical) shear strength can be correlated w ith the critical shear strength o f d islocation nucleation in a pure crystal. For exam ple, Bahr et al. [13] demonstrated in their study o f nanoindentation o f tungsten and iron single crystals that the m axim um shear stress required for d islocation nucleation show s an excellent agreement w ith the theoretical shear strength. Ohta et al. [14] devised a sophisticated experimental procedure to evaluate the critical shear stress for dislocation nucleation in silicon, w hich also com pares w ell w ith the theoretical strength [15]. To the best or our know ledge, there has been no experim ental w ork extracting the critical shear stress for dislocation nucleation in SiC , but w e believe that the value w e obtained in this study m ust be a good prediction. Experimental evaluation o f the critical shear stress for d islocation nucleation in S iC is h igh ly desirable although it can be dem anding due to the requirement o f special techniques such as preparation o f specim ens w ith an ideal shape. 10 ISSN 0556-171X. npodxeMbi npounocmu, 2008, N 1 Ab Initio DFT Study o f Ideal Shear Strength N orm al Strains an d Volume. C hanges in normal strains and volum e o f the SiC polytypes during shear deform ation are presented in Fig. 4. The hexagonal polytypes show nearly the sam e evolution o f normal strains w ith increasing shear strain. In SiC(3C) the evolution o f normal strains is different and changes in £ xx and £ yy are more obvious than in the hexagonal polytypes; the former decreases and the latter increases as the shear strain grow s. R elative volum e, V/V0 = (1 + £ xx )(1 + £ yy )(1 + £ ^ ), how ever, changes sim ilarly both in 3C and the hexagonal polytypes; i.e ., the volum e decreases w ith increasing shear strain. 0.1 0.05 0 , ■3 E -0.05 - 0.1 -0.15 by S im c ; SiC{2K SiC(4H) SiC(6H) 0 0.05 0.1 0.15 0.2 0.25 0.3 0.35 0.4 Shear strain y7I 1.1 1 . 0 5 § ci E IT 0.95 0.9 S i C ( 3 C ) + S i C ( 2 H j X S i C ( 4 H ) 0 . S i C ( 6 H ) A 0.1 0.2 0.3 0.4 0.5 Shear strain y71[ b Fig. 4. Changes in normal strains (a) and volume during shear o f SiC polytypes (b). Strain L ocaliza tion . To investigate the deform ation o f each SUC -tetrahedron lattice, w e now show in Fig. 5a the “bond shear strain,” y b , representing deform ation o f each atom ic bond as in the schem atic. In the hexagonal polytypes y b differs depending on the layer, signifying that bonds o f specific layers deform more than the others. This is analogous to non-uniform deform ation or strain localization in inhom ogeneous materials (structure). U nlike 3C, inhom ogeneous stacking structure intrinsically existing in the hexagonal polytypes causes the strain localization, w hich affects the ideal strength. The strain localization show s deviation from the intuitive picture o f the deform ation that lattices A, B, and C are ‘softer’ and A ', B ', and C ' are ‘stiffer’. In 6H -S iC , w hile lattices A and B accom m odate large and alm ost identical bond shear strain, lattice C show s a sm all deform ation and its bond shear strain is even sm aller than that o f C '. This im plies that the deform ability o f the bond is affected b y the stacking discontinuity betw een lattices C and B ' (C ' and A); i.e ., lattice C is stiffened by the overlaying lattice B ' (and similarly, C ' is softened by A). This effect is seen in the other hexagonal polytypes as w ell. The difference in deform ation among the layers can be explained by the generalized stacking fault (G SF) energy o f the shuffle-set layers show n in Fig. 5b. Here, the lattice over a shuffle-set plane is rigidly shifted along the x direction w ithout atomic relaxation w hile the lattice b elow is fixed, and the energy increase as a function o f the rigid shift is evaluated (see the schem atic in the figure). The profile o f GSF energy depends on the layer, m eaning that the bond in each layer has different “deform ability.” The layer show ing low er peak in 0 < x s < 1 has a higher deformability, w hich corresponds to strain localization found in Fig. 5a. The GSF energy profile supports the above-m entioned hypothesis o f the m echanism that the deform ability o f the bond in question is affected by the stacking discontinuity. The GSF energy landscape can be a profile representing the deform ability o f each bond subject to shear although it does not incorporate the effect o f atom istic relaxation. ISSN 0556-171X. npodxeMbi npounocmu, 2008, N 1 11 Y. Umeno, Y. Kinoshita, and T. Kitamura Normalized shift displacement x:; b a Fig. 5. (a) Evolution o f bond shear strain, y b. A, B, C and those with a prime denote the tetrahedrons as depicted in Fig. 1. (b) GSF energy landscape o f 2H and 4H with a shuffle set being rigidly shifted along the x direction. The abscissa is the shift displacement normalized with respect to the lattice width, xs = xdj X . E ffect o f P ressure. Figure 6 compares the ideal shear strengths o f the polytypes under zero and nonzero hydrostatic com pression. In the figure, both the abscissa and the ordinate are norm alized b y r 0s , the ideal shear strength under no com pression. Hydrostatic com pression significantly decreases the ideal strength in all the hexagonal polytypes studied here. The response o f the ideal shear strength to com pression can be explained b y the volum e change during shear; i.e ., the system s contract as the shear strain grow s and the com pressive normal stress helps the shear deform ation. This phenom enon is in contrast w ith the properties o f m etals, where, in general, the ideal shear strength increases under com pressive pressure [16, 17]. 1 0.S8ojl ^ 0-06 w 0.94 ■ffi gg 0.92 CD | 0.9 CO0 1 0.88o ffi 0.86 N | 0.84 z 0.82 0,8 -1.8 -1.6 -1.4 -1.2 -1 -0.8 -0.6 -0.4 -0.2 0 Normalized hydrostatic stress oh/T? Fig. 6 . Ideal shear strength as a function hydrostatic stress. Both abscissa and ordinate are normalized by r is (the ideal shear strength at Oh = 0). 12 ISSN 0556-171X. npo6neMbi npoHuocmu, 2008, № 1 Ab Initio DFT Study o f Ideal Shear Strength It w as demonstrated by Krenn et al. [18] that the effect o f com pressive stress to the shear strength is important in the interpretation o f the critical stress for plastic deform ation found in nanoindentation experim ents, because the contribution o f normal stress com ponents can change the ideal strength in shear. Therefore, our finding here is crucial as it show s that the effect o f com pressive stress to the shear strength o f covalent system can be different even qualitatively from that o f m etals. A s it has been pointed out, the relation betw een shear and normal stresses exhibits a strong anisotropic character [16] and dependence on atom species [17]. Further extensive studies for various crystals and stress conditions w ill be necessary to elucidate its m echanism . C on clusions. We have investigated the ideal shear deform ation o f SiC polytypes (3C, 2H, 4H and 6H) by m eans o f ab initio DFT calculations based on the generalized gradient approximation. The variety o f the stacking pattern in the polytypes causes strain localization, w hich is correlated w ith the GSF energy profile o f each shuffle-set plane, and difference in the ideal shear strength. We also exam ined the effect o f hydrostatic com pression to the shear deform ation to reveal that the com pressive stress decreases the ideal shear strength in all the polytypes studied here, w hich is in contrast to m etals, where in general the ideal shear strength is increased by com pression. More extensive studies w ill be required to elucidate the m echanism o f the effect o f the normal stress because it can be h ighly anisotropic and susceptible to the interatomic bonds o f the atom species Acknowledgments. One o f the authors (Y.U.) acknowledges financial support from the Grant-in-Aid for Scientific Research of Japan Society o f the Promotion of Science (JSPS, No. 1876008). 1. P. T. B. Shaffer, Acta Cryst. B, 25, 477 (1969). 2. W. J. Choyke, H. Matsunami, and G. Pensl, Silicon Carbide, Akademie Verlag, Berlin (1997). 3. W. R. L. Lambrecht, B. Segall, M. Methfessel, and M. van Schilfgaarde, Phys. Rev. B, 44, 3685 (1991). 4. P. Kackell, B. Wenzien, and F. Bechstedt, Phys. Rev. B, 50, 17037 (1994). 5. C. H. Park, B. H. Cheong, K. H. Lee, and K. J. Chang, Phys. Rev. B, 49, 4485 (1994). 6. W. Li and T. Wang, Phys. Rev. B, 59, 3993 (1999). 7. S. Ogata, J. Li, N. Hirosaki, et al., Phys. Rev. B, 70, 104104 (2004). 8. Y. Umeno, Y. Kinoshita, and T. Kitamura, Model. Simul. Mater. Sci. Eng., 15, 27 (2007). 9. G. Kresse and J. Hafner, Phys. Rev. B, 47, 558 (1993). 10. G. Kresse and J. Furthmuller, Phys. Rev. B, 54, 11169 (1996). 11. J. P. Perdew and Y. Wang, Phys. Rev. B, 45, 13244 (1992). 12. S. Ogata, Private Communication (2004). 13. D. F. Bahr, D. E. Kramer, and W. W. Germerich, Acta Mater., 46, 3605 (1998). 14. H. Ohta, H. Mura, and M. Kitano, J. Soc. Mater. Sci. Japan, 45, 1322 (1996). 15. D. Roundy and M. L. Cohen, Phys. Rev. B, 64, 212103 (2001). 16. S. Ogata, J. Li, and S. Yip, Science, 298, 807 (2002). 17. M. Cerny and J. Pokluda, Mater. Sci. Eng. A (in press). 18. C. R. Krenn, D. Roundy, M. L. Cohen, et al., Phys. Rev. B, 65, 134111 (2002). Received 28. 06. 2007 ISSN 0556-171X. npo6neMbi npouHocmu, 2008, № 1 13