Structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings prepared by the PIII&D technique from filtered vacuum-arc plasma
The results of investigations of the structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings deposited from the filtered vacuum-arc plasma under high voltage pulsed bias potential on the substrate are presented. It was found that axial texture [110] is formed in coatings when pulses potential...
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
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| Цитувати: | Structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings prepared by the PIII&D technique from filtered vacuum-arc plasma/ E.N. Reshetnyak // Вопросы атомной науки и техники. — 2014. — № 1. — С. 159-162. — Бібліогр.: 17 назв. — анг. |
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irk-123456789-799282015-04-10T03:02:02Z Structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings prepared by the PIII&D technique from filtered vacuum-arc plasma Reshetnyak, E.N. Физика и технология конструкционных материалов The results of investigations of the structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings deposited from the filtered vacuum-arc plasma under high voltage pulsed bias potential on the substrate are presented. It was found that axial texture [110] is formed in coatings when pulses potential with an amplitude 0.5…2.5 kV are applied. For TiN coatings with increasing amplitude of the potential the perfection of texture is increased and the level of residual compressive stress is decreased. As for Ti₀.₅₋xAl₀.₅YxN coatings with increasing amplitude the stress level is increased. In this case the texture is most strong outlined at the amplitude of 1 kV. With further increase in the amplitude the texture perfection becomes weaker. Differences of structure and stress state may occur due to the possibility of phase transition for multi-component coatings Ti-Al-Y-N associated with the decay of the supersaturated solid solution (Ti,Al)N stimulated by high energy ion bombardment. Приведены результаты исследований структуры и напряженного состояния TiN- и Ti₀.₅₋xAl₀.₅YxN-покрытий, полученных из фильтрованной вакуумно-дуговой плазмы при подаче высоковольтного импульсного потенциала смещения на подложку. Обнаружено, что при амплитуде импульсного потенциала 0,5…2,5 кВ в покрытиях формируется аксиальная текстура [110]. Для TiN-покрытий с ростом амплитуды степень совершенства текстуры растет, а уровень остаточных напряжений сжатия падает. Для покрытий Ti₀.₅₋xAl₀.₅YxN с ростом амплитуды уровень напряжений увеличивается. При этом наиболее совершенная текстура наблюдается при амплитуде 1 кВ. При дальнейшем увеличении амплитуды степень совершенства текстуры уменьшается. Различия структуры и напряженного состояния покрытий могут быть обусловлены возможностью фазового перехода в многокомпонентных покрытиях Ti-Al-Y-N, связанного с распадом пересыщенного твердого раствора (Ti, Al)N под действием высокоэнергетичной ионной бомбардировки Наведено результати досліджень структури і напруженого стану TiN- та Ti₀.₅₋xAl₀.₅YxN-покриттів, отриманих з фільтрованої вакуумно-дугової плазми при подачі високовольтного імпульсного потенціалу зміщення на підкладку. Виявлено, що при амплітуді імпульсного потенціалу 0,5…2,5 кВ у покриттях формується аксіальна текстура [110]. Для TiN-покриттів із зростанням амплітуди потенціалу ступінь досконалості текстури зростає, а рівень залишкових напружень стиснення падає. Для покриттів Ti₀.₅₋xAl₀.₅YxN із зростанням амплітуди рівень напружень збільшується. При цьому найбільш досконала текстура спостерігається при амплітуді 1 кВ. При подальшому збільшенні амплітуди ступінь досконалості текстури зменшується. Відмінності структури і напруженого стану покриттів можуть бути обумовлені можливістю фазового переходу в багатокомпонентних покриттях Ti-Al-Y-N, пов'язаного з розпадом пересиченого твердого розчину (Ti, Al)N під впливом високоенергетичного іонного бомбардування. 2014 Article Structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings prepared by the PIII&D technique from filtered vacuum-arc plasma/ E.N. Reshetnyak // Вопросы атомной науки и техники. — 2014. — № 1. — С. 159-162. — Бібліогр.: 17 назв. — анг. 1562-6016 http://dspace.nbuv.gov.ua/handle/123456789/79928 621.793: 548.73 en Вопросы атомной науки и техники Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| institution |
Digital Library of Periodicals of National Academy of Sciences of Ukraine |
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DSpace DC |
| language |
English |
| topic |
Физика и технология конструкционных материалов Физика и технология конструкционных материалов |
| spellingShingle |
Физика и технология конструкционных материалов Физика и технология конструкционных материалов Reshetnyak, E.N. Structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings prepared by the PIII&D technique from filtered vacuum-arc plasma Вопросы атомной науки и техники |
| description |
The results of investigations of the structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings deposited from the filtered vacuum-arc plasma under high voltage pulsed bias potential on the substrate are presented. It was found that axial texture [110] is formed in coatings when pulses potential with an amplitude 0.5…2.5 kV are applied. For TiN coatings with increasing amplitude of the potential the perfection of texture is increased and the level of residual compressive stress is decreased. As for Ti₀.₅₋xAl₀.₅YxN coatings with increasing amplitude the stress level is increased. In this case the texture is most strong outlined at the amplitude of 1 kV. With further increase in the amplitude the texture perfection becomes weaker. Differences of structure and stress state may occur due to the possibility of phase transition for multi-component coatings Ti-Al-Y-N associated with the decay of the supersaturated solid solution (Ti,Al)N stimulated by high energy ion bombardment. |
| format |
Article |
| author |
Reshetnyak, E.N. |
| author_facet |
Reshetnyak, E.N. |
| author_sort |
Reshetnyak, E.N. |
| title |
Structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings prepared by the PIII&D technique from filtered vacuum-arc plasma |
| title_short |
Structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings prepared by the PIII&D technique from filtered vacuum-arc plasma |
| title_full |
Structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings prepared by the PIII&D technique from filtered vacuum-arc plasma |
| title_fullStr |
Structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings prepared by the PIII&D technique from filtered vacuum-arc plasma |
| title_full_unstemmed |
Structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings prepared by the PIII&D technique from filtered vacuum-arc plasma |
| title_sort |
structure and stress state of tin and ti₀.₅₋xal₀.₅yxn coatings prepared by the piii&d technique from filtered vacuum-arc plasma |
| publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
| publishDate |
2014 |
| topic_facet |
Физика и технология конструкционных материалов |
| url |
http://dspace.nbuv.gov.ua/handle/123456789/79928 |
| citation_txt |
Structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings prepared by the PIII&D technique from filtered vacuum-arc plasma/ E.N. Reshetnyak // Вопросы атомной науки и техники. — 2014. — № 1. — С. 159-162. — Бібліогр.: 17 назв. — анг. |
| series |
Вопросы атомной науки и техники |
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AT reshetnyaken structureandstressstateoftinandti05xal05yxncoatingspreparedbythepiiidtechniquefromfilteredvacuumarcplasma |
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2025-07-06T03:51:36Z |
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2025-07-06T03:51:36Z |
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1836868065830109184 |
| fulltext |
ISSN 1562-6016. ВАНТ. 2014. №1(89) 159
UDC 621.793: 548.73
STRUCTURE AND STRESS STATE OF TiN AND Ti0.5-XAl0.5YXN
COATINGS PREPARED BY THE PIII&D TECHNIQUE FROM
FILTERED VACUUM-ARC PLASMA
E.N. Reshetnyak
National Science Center “Kharkov Institute of Physics and Technology”, Kharkov, Ukraine
E-mail: reshetnyak@kipt.kharkov.ua
The results of investigations of the structure and stress state of TiN and Ti0.5-xAl0.5YxN coatings deposited from
the filtered vacuum-arc plasma under high voltage pulsed bias potential on the substrate are presented. It was found
that axial texture [110] is formed in coatings when pulses potential with an amplitude 0.5…2.5 kV are applied. For
TiN coatings with increasing amplitude of the potential the perfection of texture is increased and the level of
residual compressive stress is decreased. As for Ti0.5-xAl0.5YxN coatings with increasing amplitude the stress level is
increased. In this case the texture is most strong outlined at the amplitude of 1 kV. With further increase in the
amplitude the texture perfection becomes weaker. Differences of structure and stress state may occur due to the
possibility of phase transition for multi-component coatings Ti-Al-Y-N associated with the decay of the
supersaturated solid solution (Ti,Al)N stimulated by high energy ion bombardment.
INTRODUCTION
The vacuum arc nitride coatings on the base of TiN
are widely used for hardening the surface of the parts of
machines and cutting tools. Most of the recent studies
are now focusing on multicomponent and nano-
structured nitride-based coatings. The experimental data
available indicate that new types coatings may have
unique properties for usage in various branch of indus-
try: high hardness, wear resistant, thermal stability and
oxidation resistance and enough low friction coefficient
[1, 2]. However the droplet phase of the cathode mate-
rial in the plasma stream of the vacuum-arc plasma
source worsens the quality of the coating deposited.
High level of the surface roughness and residual stress
restrict essentially the possibilities of usage such coat-
ings for the purpose of hardening the machinery friction
pairs [3-5].
The last years were marked by considerable progress
in development the vacuum-arc deposition method.
Three main techniques should be noted which facilitate
the qualitative vacuum-arc nitride coatings deposition:
plasma filtration, applying high voltage pulses to the
substrate, choice of proper composition of multi-
component nanostructured coatings. Plasma immersion
ion implantation and deposition (PIII&D) is a technique
for the effective combination of these techniques. Gen-
erally, in PIII&D vacuum arc source with magnetic fil-
ter for plasma is used and negative bias voltages ranging
from a few hundred to a few thousand volts are applied
to the substrates in a pulsed manner [6-13].
The use of plasma filtration can significantly im-
prove the coatings quality by formation of a more uni-
form structure with low surface roughness due to a re-
duction of large macroparticles content in the plasma
flow. А high-voltage pulsed bias applied to the substrate
permits the deposition of thicker coatings with good
adhesion and low residual stresses at low substrate tem-
perature.
There are the data in literature on the effect of pulses
amplitude on the level of residual stresses in simple
single-phases nitrides (e.g. TiN, AlN) [11-13]. An in-
crease in internal stresses is observed up to -500 V pulse
bias voltage, which gradually decrease, with increasing
bias voltage magnitude. The observed change in the
level of intrinsic stress is explained with the model pro-
posed by Davies [14]. This model is based on the com-
petitive effects that occur during subplantation of ions
under the growing surface of the film and its relaxation
during the high energy ion bombardment.
In our recent papers we studied the structure and
some properties of the coatings Ti0.5Al0.5N, alloyed with
small additions of Y (up to 1 at.%), which were
produced by PIII&D technique. Multi-component
nitride coatings had significantly better the oxidation
resistance and wear resistance in comparison with
titanium nitride [9, 10]. It was found that the
dependence of the residual stress on the pulsed voltage
potential is non-monotonic with a minimum when the
amplitude was of 1 kV.
In this paper, a comparative study of the structure
and stress state of Ti0.5-xAl0.5YxN, and TiN coatings
deposited under identical conditions from the filtered
vacuum arc plasma under pulsed bias potential on the
substrate was carried out.
MATERIALS AND METHODS
Coatings of Ti-N and Ti-Al-Y-N systems of
6…8 micron thickness were deposited from the filtered
vacuum arc plasma at a nitrogen pressure of 0,1 Pa and
arc current of 100 A using cathodes made of
commercially pure titanium and alloy Ti0.49Al0.5Y0.01
respectively. Deposition was carried out on substrates
made of tool steel with a diameter of 17 mm and
thickness of 3 mm. The negative potential pulses with
an amplitude AU in the range 0…2.5 kV were applied to
the substrate with a repetition frequency of 24 kHz. The
pulse duration was 5 μs. In the intervals between pulses
the substrate was under a self-consistent "floating"
potential -(3…15) V.
The elemental composition of the coatings was
controlled by X-ray fluorescence analysis at the vacuum
scanning crystal-diffraction spectrometer SPRUT.
X-ray diffraction studies, including analysis of the
phase composition, determination of residual stresses
160 ISSN 1562-6016. ВАНТ. 2014. №1(89)
and the parameters of the crystal structure were carried
out in the filtered Cu-Kα radiation on DRON-3
diffractometer. The grain size (coherent scattering zone)
in the nitride films was calculated from the (111) or
(220) peak broadening, using the Scherrer relation.
Determination of residual macroscopic stresses in the
films was carried out by X-ray tensometry (sin2ψ-
method modified for textured samples). Stresses were
calculated using a-sin2ψ plots in approach of quasi-
isotropic symmetric biaxial stress state.
RESULTS AND DISCUSSION
X-ray fluorescence analysis of the elemental compo-
sition of the coatings showed that the change in the am-
plitude of the pulse bias potential on the substrate in the
range 0…2.5 kV has no significant effect on the ele-
mental composition of the coatings. The ratio of metal
components in a multicomponent cathode is well repro-
duced in the films.
According to X-ray diffraction data the single crystal
phase in the coatings is the cubic nitride with the struc-
ture of titanium nitride (structural type NaCl). Diffrac-
tion patterns of the investigated coatings are shown in
Fig. 1.
The ratio of the intensities of the diffraction peaks
differs from the value characteristic to the chaotic orien-
tation of crystallites in which the strongest line is (200),
which indicates the presence of texture. Three reflec-
tions: (111), (200) and (220) were taken into account
when texture coefficients TC were calculated. The tex-
ture coefficient was defined as [13]:
( ) ( ) ( ) ( )
0 0/ / /hkl hkl hkl hkl
C m mT nI I I I⎡ ⎤ ⎡ ⎤= ⎣ ⎦ ⎣ ⎦∑ , where ( )hkl
mI is
the measured intensity of (hkl) reflection; ( )
0
hklI is the
theoretical relative intensity of (hkl) reflection for pow-
der material with random-orientation and n is the total
number of observed reflections ( 3n = ). The results of
the calculations are presented in Fig. 2.
When substrate bias potential is floating, the crystal-
lites of nitride are orientated with (111) plane parallel to
the surface of the coating. The average size of coherent
scattering regions in the coatings is 20 nm. When high-
voltage pulses of potential with an amplitude
0.5…2.5 kV are applied to the substrate a change in
preferred orientation occurs with the formation of a
strong axial texture [110]. The only detectable line in
the diffraction patterns is (220). Analysis of the diffrac-
tion patterns and rocking curves have shown that with
increasing amplitude of the pulse potential the degree of
perfection of TiN coatings texture increases and the
grain size is in the range 11…14 nm.
For Ti0.5-xAl0.5YxN coatings the texture is most
strong outlined at the amplitude of 1 kV. With further
increase in the amplitude the texture perfection becomes
weaker and the grain size decreases from 14 to 7 nm. In
the diffractogram of the film Ti0.5-xAl0.5YxN deposited
with the amplitude of the pulses of 2.5 kV the intensity
of the (220) line is significantly reduced and one more,
weak line appeared, which can be identified as (200).
However, a closer examination revealed a large differ-
ence in the values of the nitride lattice period, calculated
on the positions of these diffraction lines, which
amounted to (0.4209 ± 0.0003) nm and
(0.4238 ± 0.0005) nm respectively. One could assume
that these lines belong to two different cubic nitride
phases of various compositions. This hypothesis was
indirectly confirmed in further studies.
30 40 50 60 70 80
S
2 ,5 kV
1,5 kV
1 kV
0,5 kV
F loat
In
te
ns
ity
, a
rb
. u
ni
ts
.
2θ , degree
(2
22
)
(3
11
)
(2
20
)
S(2
00
)
(1
11
)
a
3 0 4 0 5 0 6 0 7 0 8 0
SS
1 ,5 k V
(3
11
)
(2
22
)
(2
00
)
(2
20
)
(1
11
)
2 ,5 k V
1 k V
0 ,5 k V
In
te
ns
ity
, a
rb
. u
ni
ts
.
2 θ , d eg ree
F lo a t
b
Fig. 1. X-ray diffraction patterns of vacuum-arc
coatings deposited from the filtered plasma at different
amplitude pulsed substrate bias potential (emission of
Cu-Kα, dashed lines show the position of peaks of TiN,
“S” indicates the line of the substrate):
a – coating TiN; b – coating Ti0.5-xAl0.5YxN
X-ray tensometry method was applied to investigate
the strain/stress state which has allowed determine the
level of residual stresses and the period a0 of the crystal
lattice of textured nitride in the unstressed state. Values
of a0 periods for both the considered systems are not
varied with the amplitude of the pulse substrate bias
potential. In the TiN films the value of the period is
closed to 0.424 nm, characteristic of the unstressed
nitride of stoichiometric composition. The period of the
crystal lattice in the coatings Ti0.5-xAl0.5YxN is slightly
smaller than 0.418 nm, calculated according to Vegard's
law for the lattice of the solid solution of cubic TiN
(aTiN = 0.424 nm) and AlN (aAlN = 0.412 nm) with an
equal content of Ti and Al atoms. The presence of
yttrium in solid solution is improbable because of the
ISSN 1562-6016. ВАНТ. 2014. №1(89) 161
large difference in periods of nitrides (aYN = 0.489 nm).
Some authors think that in the films of such
composition a solid solution (Ti, Al)N is formed with
halfway replacement of Ti atoms in the cubic structure
of TiN with smaller atoms Al, and Y is not dissolved in
the lattice and involved in the process of grain
boundaries formation [15, 16].
0.0 0.5 1.0 1.5 2.0 2.5
0
1
2
3
Bias (kV)
Te
xt
ur
e
co
ef
fic
ie
nt
(111)
(200)
(220)
a
0.0 0.5 1.0 1.5 2.0 2.5
0
1
2
3
Bias (kV)
Te
xt
ur
e
co
ef
fic
ie
nt
(111)
(200)
(220)
b
Fig. 2. Dependence of the texture coefficient for the
(111), (200) and (220) reflections on the pulse bias
potential: a – coating TiN; b – coating Ti0.5-xAl0.5YxN
Supersaturated solid solution (Ti,Al)N is metastable,
and under certain conditions, the formation of
heterophase films is possible due to the partial
decomposition of this phase. As the result of such
process the nitrides rich in one metal component are
formed. Our experiments show the possibility of such
phase transition in Ti0.5-xAl0.5YxN films deposited at the
amplitude of pulsed substrate bias potential over 1 kV.
It is likely that (220) peak in the diffraction pattern of
the coating deposited at 2.5 kV corresponds to the
undecayed component of the solid solution, and the
(200) peak belongs to the titanium-enriched nitride.
Another product of decomposition, aluminum-rich
nitride, can not be detected in the diffraction pattern due
to its lower reflectivity.
Such phase transformation may be the reason of
differences in the behavior of the dependence of
residual compressive stress on the amplitude of the
pulsed potential for TiN and Ti0.5-xAl0.5YxN coatings
shown in Fig. 3. For TiN the well-known dependence of
the residual stress is non-monotonic with a maximum at
0.5 kV. For Ti0.5-xAl0.5YxN coatings the dependence is
non-monotonic with a minimum. The level of stress
increases when the amplitude exceeds 1 kV. Such an
increase can be attributed to an increase in specific
volume value which should occur in the film fixed to
the substrate as the result of decomposition of
metastable supersaturated solid solution (Ti, Al)N on
the stable cubic TiN and hexagonal AlN phases.
Estimates show that the increase in specific volume can
reach 10%, which produce compressive stress 5 GPa.
0.0 0.5 1.0 1.5 2.0 2.5 3.0
2
4
6
8
10
12
St
re
ss
(G
Pa
)
Bias (kV)
- TiN
- (Ti,Al)N
Fig. 3. Influence of the amplitude of the pulsed bias
potential on the level of residual compressive stresses
on TiN and Ti0.5-xAl0.5YxN coatings
Another indirect evidence of phase transformation is
the hardness of the coatings. The hardness of TiN
coatings is 30…35 GPa and practically does not depend
on the amplitude of the bias potential on the substrate
[17]. Coatings Ti0.5-xAl0.5YxN also are characterized by
relatively high hardness of 35 GPa regardless the
substrate bias potential value in the range 0.5…1.5 kV
[10]. The exception is the coating deposited at
amplitude of pulse potential 2.5 kV, which hardness is
reduced to 25 GPa may be due to the presence of the
relatively “soft” AlN phase.
CONCLUSIONS
Thus, the differences in the stress state of TiN and
Ti0.5-xAl0.5YxN (with x∼0.01) coatings deposited by the
filtered vacuum-arc plasma under pulsed substrate bias
potential were revealed. The crystalline phase in the
films is a nitride with a cubic NaCl-type structure. In the
Ti0.5-xAl0.5YxN coatings the atoms of aluminum enter
into a solid solution (Ti, Al)N. It was found that axial
texture [110] is formed in coatings when pulses poten-
tial with an amplitude 0.5…2.5 kV are applied.
For TiN films, the dependence of the residual com-
pressive stress on the amplitude of the pulsed voltage
potential is non-monotonic with a maximum at 0.5 kV.
Decrease in the residual stress level and increase perfec-
tion of texture takes place when the amplitude of the
potential is increased in the range 0.5…2.5 kV.
For multi-component coatings Ti0.5-xAl0.5YxN the
dependence of the residual stress on the amplitude of
the pulsed voltage potential is non-monotonic with a
minimum at 1 kV. In this case the texture is most
strong. With further increase in the amplitude the tex-
ture perfection becomes weaker and stress increases. It
is shown that the dependence of the residual stress for
multi-component coatings Ti-Al-Y-N may occur due to
the possibility of phase transition associated with the
decay of the supersaturated solid solution (Ti, Al)N
stimulated by high energy ion bombardment.
Acknowledgements
The author would like to thank V.V. Vasyliev,
A.A. Luchaninov, and V.E. Strel’nitskij for depositing
the samples and for helpful discussions.
162 ISSN 1562-6016. ВАНТ. 2014. №1(89)
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Статья поступила в редакцию 02.12.2013 г.
СТРУКТУРА И НАПРЯЖЕННОЕ СОСТОЯНИЕ TiN- И Ti0.5-XAl0.5YXN-ПОКРЫТИЙ,
ПОЛУЧЕННЫХ МЕТОДОМ PIII&D ИЗ ФИЛЬТРОВАННОЙ ВАКУУМНО-ДУГОВОЙ ПЛАЗМЫ
Е.Н. Решетняк
Приведены результаты исследований структуры и напряженного состояния TiN- и Ti0.5-xAl0.5YxN-покрытий, полу-
ченных из фильтрованной вакуумно-дуговой плазмы при подаче высоковольтного импульсного потенциала смещения
на подложку. Обнаружено, что при амплитуде импульсного потенциала 0,5…2,5 кВ в покрытиях формируется аксиаль-
ная текстура [110]. Для TiN-покрытий с ростом амплитуды степень совершенства текстуры растет, а уровень остаточных
напряжений сжатия падает. Для покрытий Ti0.5-xAl0.5YxN с ростом амплитуды уровень напряжений увеличивается. При
этом наиболее совершенная текстура наблюдается при амплитуде 1 кВ. При дальнейшем увеличении амплитуды степень
совершенства текстуры уменьшается. Различия структуры и напряженного состояния покрытий могут быть обусловле-
ны возможностью фазового перехода в многокомпонентных покрытиях Ti-Al-Y-N, связанного с распадом пересыщенно-
го твердого раствора (Ti, Al)N под действием высокоэнергетичной ионной бомбардировки.
СТРУКТУРА I НАПРУЖЕНИЙ СТАН TiN- ТА Ti0.5-XAl0.5YXN-ПОКРИТТІВ, ОТРИМАНИХ
МЕТОДОМ PIII&D З ФІЛЬТРОВАНОЇ ВАКУУМНО-ДУГОВОЇ ПЛАЗМИ
О.М. Решетняк
Наведено результати досліджень структури і напруженого стану TiN- та Ti0.5-xAl0.5YxN-покриттів, отриманих з філь-
трованої вакуумно-дугової плазми при подачі високовольтного імпульсного потенціалу зміщення на підкладку. Виявле-
но, що при амплітуді імпульсного потенціалу 0,5…2,5 кВ у покриттях формується аксіальна текстура [110]. Для TiN-
покриттів із зростанням амплітуди потенціалу ступінь досконалості текстури зростає, а рівень залишкових напружень
стиснення падає. Для покриттів Ti0.5-xAl0.5YxN із зростанням амплітуди рівень напружень збільшується. При цьому най-
більш досконала текстура спостерігається при амплітуді 1 кВ. При подальшому збільшенні амплітуди ступінь доскона-
лості текстури зменшується. Відмінності структури і напруженого стану покриттів можуть бути обумовлені можливістю
фазового переходу в багатокомпонентних покриттях Ti-Al-Y-N, пов'язаного з розпадом пересиченого твердого розчину
(Ti, Al)N під впливом високоенергетичного іонного бомбардування.
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