Simulation of high power deposition on target materials: applications in magnetic, inertial fusion, and high power plasma lithography devices

Simulation of high power deposition on target materials: applications in magnetic, inertial fusion, and high power plasma lithography devices

High power and particle deposition on target materials are encountered in many applications including magnetic and inertial fusion devices, nuclear and high energy physics applications, and laser and discharge produced plasma devices. Surface and structural damage to plasma-facing components due t...

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Datum:2006
1. Verfasser: Hassanein, A.
Format: Artikel
Sprache:English
Veröffentlicht: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2006
Schriftenreihe:Вопросы атомной науки и техники
Schlagworte:
Plasma dynamics and plasma wall interaction
Online Zugang:http://dspace.nbuv.gov.ua/handle/123456789/82150
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Zitieren:Simulation of high power deposition on target materials: applications in magnetic, inertial fusion, and high power plasma lithography devices / A. Hassanein // Вопросы атомной науки и техники. — 2006. — № 6. — С. 130-134. — Бібліогр.: 12 назв. — англ.

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spelling irk-123456789-821502015-05-26T03:02:15Z Simulation of high power deposition on target materials: applications in magnetic, inertial fusion, and high power plasma lithography devices Hassanein, A. Plasma dynamics and plasma wall interaction High power and particle deposition on target materials are encountered in many applications including magnetic and inertial fusion devices, nuclear and high energy physics applications, and laser and discharge produced plasma devices. Surface and structural damage to plasma-facing components due to the frequent loss of plasma confinement remains a serious problem for the Tokamak reactor concept. The deposited plasma energy causes significant surface erosion, possible structural failure, and frequent plasma contamination. The chamber walls in inertial fusion energy (IFE) reactors are also exposed to harsh conditions following each target implosion. Key issues include intense photon and ion deposition, wall thermal and hydrodynamic evolution, wall erosion and fatigue lifetime, and chamber clearing and evacuation to ensure desirable conditions prior to next target implosion. Both Laser and Discharge produced plasma are being used as a light source for extreme ultraviolet (EUV) lithography. A key challenge for Discharge Produced Plasma (DPP) and laser produced plasma (LPP) devices is achieving sufficient brightness to support the throughput requirements of High-Volume Manufacturing lithography exposure tools. An integrated model for the description of hydrodynamics and optical processes in a DPP device has been developed, integrated. And benchmarked. 2006 Article Simulation of high power deposition on target materials: applications in magnetic, inertial fusion, and high power plasma lithography devices / A. Hassanein // Вопросы атомной науки и техники. — 2006. — № 6. — С. 130-134. — Бібліогр.: 12 назв. — англ. 1562-6016 PACS: 52.59.-f, 29.25.-t, 28.50.-K, 24.10.Nz, 21.60.Ka, 32.80.-t http://dspace.nbuv.gov.ua/handle/123456789/82150 en Вопросы атомной науки и техники Національний науковий центр «Харківський фізико-технічний інститут» НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
topic Plasma dynamics and plasma wall interaction
Plasma dynamics and plasma wall interaction
spellingShingle Plasma dynamics and plasma wall interaction
Plasma dynamics and plasma wall interaction
Hassanein, A.
Simulation of high power deposition on target materials: applications in magnetic, inertial fusion, and high power plasma lithography devices
Вопросы атомной науки и техники
description High power and particle deposition on target materials are encountered in many applications including magnetic and inertial fusion devices, nuclear and high energy physics applications, and laser and discharge produced plasma devices. Surface and structural damage to plasma-facing components due to the frequent loss of plasma confinement remains a serious problem for the Tokamak reactor concept. The deposited plasma energy causes significant surface erosion, possible structural failure, and frequent plasma contamination. The chamber walls in inertial fusion energy (IFE) reactors are also exposed to harsh conditions following each target implosion. Key issues include intense photon and ion deposition, wall thermal and hydrodynamic evolution, wall erosion and fatigue lifetime, and chamber clearing and evacuation to ensure desirable conditions prior to next target implosion. Both Laser and Discharge produced plasma are being used as a light source for extreme ultraviolet (EUV) lithography. A key challenge for Discharge Produced Plasma (DPP) and laser produced plasma (LPP) devices is achieving sufficient brightness to support the throughput requirements of High-Volume Manufacturing lithography exposure tools. An integrated model for the description of hydrodynamics and optical processes in a DPP device has been developed, integrated. And benchmarked.
format Article
author Hassanein, A.
author_facet Hassanein, A.
author_sort Hassanein, A.
title Simulation of high power deposition on target materials: applications in magnetic, inertial fusion, and high power plasma lithography devices
title_short Simulation of high power deposition on target materials: applications in magnetic, inertial fusion, and high power plasma lithography devices
title_full Simulation of high power deposition on target materials: applications in magnetic, inertial fusion, and high power plasma lithography devices
title_fullStr Simulation of high power deposition on target materials: applications in magnetic, inertial fusion, and high power plasma lithography devices
title_full_unstemmed Simulation of high power deposition on target materials: applications in magnetic, inertial fusion, and high power plasma lithography devices
title_sort simulation of high power deposition on target materials: applications in magnetic, inertial fusion, and high power plasma lithography devices
publisher Національний науковий центр «Харківський фізико-технічний інститут» НАН України
publishDate 2006
topic_facet Plasma dynamics and plasma wall interaction
url http://dspace.nbuv.gov.ua/handle/123456789/82150
citation_txt Simulation of high power deposition on target materials: applications in magnetic, inertial fusion, and high power plasma lithography devices / A. Hassanein // Вопросы атомной науки и техники. — 2006. — № 6. — С. 130-134. — Бібліогр.: 12 назв. — англ.
series Вопросы атомной науки и техники
work_keys_str_mv AT hassaneina simulationofhighpowerdepositionontargetmaterialsapplicationsinmagneticinertialfusionandhighpowerplasmalithographydevices
first_indexed 2025-07-06T08:25:31Z
last_indexed 2025-07-06T08:25:31Z
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