Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures
Single and dual frequency capacitively coupled plasma (CCP) sources operating in pure Ar, O₂ and Ar/O₂ mixtures are investigated by means of particle-in-cell/Monte Carlo collisions (PIC/MCC) simulations. The different possibilities to control ion energy distribution functions (IEDFs) and ion ang...
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Date: | 2006 |
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Main Authors: | , , |
Format: | Article |
Language: | English |
Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2006
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Series: | Вопросы атомной науки и техники |
Subjects: | |
Online Access: | http://dspace.nbuv.gov.ua/handle/123456789/82350 |
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Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
Cite this: | Ion energy and ion angular distributions in RF capacitively coupled plasma sources: pure argon and argon-oxygen mixtures / O.V. Manuilenko, K.M. Minaeva, V.I. Golota // Вопросы атомной науки и техники. — 2006. — № 6. — С. 228-230. — Бібліогр.: 7 назв. — англ. |