Preparation of terbium monosulfide thin crystalline film
A process is described for the growth of thin crystalline TbS films ranging in thickness from 0,3 to 1,8 µm by flash vacuum thermal evaporation from preliminary synthesed bulk crystal of TbS. The films was grown on glass-ceramic, fused silica, sapphire and (111) single-crystal silicon. Thin film...
Gespeichert in:
| Datum: | 2010 |
|---|---|
| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | Russian |
| Veröffentlicht: |
Науковий фізико-технологічний центр МОН та НАН України
2010
|
| Schriftenreihe: | Физическая инженерия поверхности |
| Online Zugang: | http://dspace.nbuv.gov.ua/handle/123456789/98913 |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Preparation of terbium monosulfide thin crystalline film / I.G. Tabatadze, Z.U. Jabua, A.V. Gigineisvili, I.L. Kupreisvili // Физическая инженерия поверхности. — 2010. — Т. 8, № 4. — С. 333–335. — Бібліогр.: 12 назв. — рос. |
Institution
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Zusammenfassung: | A process is described for the growth of thin crystalline TbS films ranging in thickness from 0,3 to
1,8 µm by flash vacuum thermal evaporation from preliminary synthesed bulk crystal of TbS. The
films was grown on glass-ceramic, fused silica, sapphire and (111) single-crystal silicon. Thin films
had cubic crystal structure (NaCl structure type) with lattice parameters a = 5,52 Å. |
|---|