Production of metal and dielectric films in a combined RF and arc discharge

In the presentation we investigate the possibilities to deposit metallic and dielectric films on metal and dielectric materials by means of vacuum technology with application of high frequency (RF) electric fields. As a base-model the device “Bulat-6” was used with proper arc evaporators. The leadin...

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Bibliographic Details
Date:2003
Main Authors: Gasilin, V.V., Kunchenko, V.V., Nezovybat’ko, Yu.N., Taran, A.V., Taran, V.S., Tereshin, V.I., Shvets, O.M.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2003
Series:Вопросы атомной науки и техники
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Production of metal and dielectric films in a combined RF and arc discharge / V.V. Gasilin, V.V. Kunchenko, Yu.N. Nezovybat’ko, A.V. Taran, V.S. Taran, V.I. Tereshin, O.M. Shvets // Вопросы атомной науки и техники. — 2003. — № 1. — С. 157-159. — Бібліогр.: 3 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine