Low-temperature growth of diamond films using supersonic DC arcjet

Diamond film growth on silicon at substrate temperature between 180 to 360 oC has been studied. The influence of hydrocarbon source on growth conditions and on diamond quality has been also investigated. Several series of experiments were performed to investigate the influence of substrate temperatu...

Повний опис

Збережено в:
Бібліографічні деталі
Дата:2001
Автори: Romanyuk, A., Gottler, H., Popov, V.
Формат: Стаття
Мова:English
Опубліковано: Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України 2001
Назва видання:Semiconductor Physics Quantum Electronics & Optoelectronics
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Назва журналу:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Цитувати:Low-temperature growth of diamond films using supersonic DC arcjet / A. Romanyuk, H. Gottler, V. Popov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 3. — С. 187-191. — Бібліогр.: 7 назв. — англ.

Репозитарії

Digital Library of Periodicals of National Academy of Sciences of Ukraine
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spelling oai:nasplib.isofts.kiev.ua:123456789-1192722025-02-23T17:33:22Z Low-temperature growth of diamond films using supersonic DC arcjet Romanyuk, A. Gottler, H. Popov, V. Diamond film growth on silicon at substrate temperature between 180 to 360 oC has been studied. The influence of hydrocarbon source on growth conditions and on diamond quality has been also investigated. Several series of experiments were performed to investigate the influence of substrate temperature on the diamond growth rate and the diamond quality. The quality of the deposited diamond films was controlled with Raman spectroscopy. It was shown that using methane as hydrocarbon source the growth rate up to 1.5 μm/h can be achieved. The use of ethane leads to the lower growth rate, but the quality of diamond film, crystallite morphology are better. Decrease of the substrate temperature down to 180°C leads to smaller grain size as well as to decreasing of diamond impact in the film. 2001 Article Low-temperature growth of diamond films using supersonic DC arcjet / A. Romanyuk, H. Gottler, V. Popov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 3. — С. 187-191. — Бібліогр.: 7 назв. — англ. 1560-8034 PACS: 68.55, 78.30, 81.15 https://nasplib.isofts.kiev.ua/handle/123456789/119272 en Semiconductor Physics Quantum Electronics & Optoelectronics application/pdf Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
institution Digital Library of Periodicals of National Academy of Sciences of Ukraine
collection DSpace DC
language English
description Diamond film growth on silicon at substrate temperature between 180 to 360 oC has been studied. The influence of hydrocarbon source on growth conditions and on diamond quality has been also investigated. Several series of experiments were performed to investigate the influence of substrate temperature on the diamond growth rate and the diamond quality. The quality of the deposited diamond films was controlled with Raman spectroscopy. It was shown that using methane as hydrocarbon source the growth rate up to 1.5 μm/h can be achieved. The use of ethane leads to the lower growth rate, but the quality of diamond film, crystallite morphology are better. Decrease of the substrate temperature down to 180°C leads to smaller grain size as well as to decreasing of diamond impact in the film.
format Article
author Romanyuk, A.
Gottler, H.
Popov, V.
spellingShingle Romanyuk, A.
Gottler, H.
Popov, V.
Low-temperature growth of diamond films using supersonic DC arcjet
Semiconductor Physics Quantum Electronics & Optoelectronics
author_facet Romanyuk, A.
Gottler, H.
Popov, V.
author_sort Romanyuk, A.
title Low-temperature growth of diamond films using supersonic DC arcjet
title_short Low-temperature growth of diamond films using supersonic DC arcjet
title_full Low-temperature growth of diamond films using supersonic DC arcjet
title_fullStr Low-temperature growth of diamond films using supersonic DC arcjet
title_full_unstemmed Low-temperature growth of diamond films using supersonic DC arcjet
title_sort low-temperature growth of diamond films using supersonic dc arcjet
publisher Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
publishDate 2001
citation_txt Low-temperature growth of diamond films using supersonic DC arcjet / A. Romanyuk, H. Gottler, V. Popov // Semiconductor Physics Quantum Electronics & Optoelectronics. — 2001. — Т. 4, № 3. — С. 187-191. — Бібліогр.: 7 назв. — англ.
series Semiconductor Physics Quantum Electronics & Optoelectronics
work_keys_str_mv AT romanyuka lowtemperaturegrowthofdiamondfilmsusingsupersonicdcarcjet
AT gottlerh lowtemperaturegrowthofdiamondfilmsusingsupersonicdcarcjet
AT popovv lowtemperaturegrowthofdiamondfilmsusingsupersonicdcarcjet
first_indexed 2025-07-22T04:20:08Z
last_indexed 2025-07-22T04:20:08Z
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