Sun, H., Ma, X., & Hu, C. (2016). Stamp stress analysis with low temperature nanoimprint lithography. НТК «Інститут монокристалів» НАН України.
Chicago Style (17th ed.) CitationSun, Hongwen, Xiaochao Ma, and Chenhui Hu. Stamp Stress Analysis with Low Temperature Nanoimprint Lithography. НТК «Інститут монокристалів» НАН України, 2016.
MLA (8th ed.) CitationSun, Hongwen, et al. Stamp Stress Analysis with Low Temperature Nanoimprint Lithography. НТК «Інститут монокристалів» НАН України, 2016.
Warning: These citations may not always be 100% accurate.