Stamp stress analysis with low temperature nanoimprint lithography
High temperature nanoimprint lithography has the drawback of long process cycle, demoulding difficulty, polymer degradation, thermal stress. Low temperature nanoimprint lithography (LTNIL) can avoid these problems. LTNIL is also ideal for manufacturing biological compatibility samples since the samp...
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| Datum: | 2016 |
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| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | English |
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НТК «Інститут монокристалів» НАН України
2016
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| Schriftenreihe: | Functional Materials |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Zitieren: | Stamp stress analysis with low temperature nanoimprint lithography / Hongwen Sun, Xiaochao Ma, Chenhui Hu // Functional Materials. — 2016. — Т. 23, № 3. — С. 517-520. — Бібліогр.: 11 назв. — англ. |
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