Design and research of combined magnetron-ion-beam sputtering system
The design and characteristics of a new combined magnetron-ion-beam sputtering system are presented. The system allows coating deposition both by means of magnetron discharge, and by sputtering of complex composite targets by high-energy ion beam. Computer simulation and optimization of magnetic fie...
Збережено в:
| Дата: | 2018 |
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| Автори: | , , , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2018
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| Назва видання: | Вопросы атомной науки и техники |
| Теми: | |
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| Назва журналу: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Цитувати: | Design and research of combined magnetron-ion-beam sputtering system / S. Dudin, O. Tkachenko, A. Shchybria, S. Yakovin, A. Zykov, N. Yefymenko // Вопросы атомной науки и техники. — 2018. — № 6. — С. 263-266. — Бібліогр.: 9 назв. — англ. |
Репозитарії
Digital Library of Periodicals of National Academy of Sciences of Ukraine| Резюме: | The design and characteristics of a new combined magnetron-ion-beam sputtering system are presented. The system allows coating deposition both by means of magnetron discharge, and by sputtering of complex composite targets by high-energy ion beam. Computer simulation and optimization of magnetic field topology on the system,
which is common for the magnetron discharge and the Hall-type ion source, have been carried out. The ignition
curves, current-voltage characteristics of the system, in dependence on gas type and pressure, magnitude and topology of magnetic field have been researched both for autonomous operation of the planar magnetron discharge and
ion source and for their combination. Spatial distributions of ion current are also presented. |
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