Features of plasma chemical etching of lithium tantalate substrate (LiTaO₃)

Features of plasma chemical etching of lithium tantalate substrate (LiTaO₃)

The results of researches of plasma chemical treatment of lithium monocrystalline tantalate (LiTaO₃) from gas type, bias voltage (energy of chemically active ions) and from current of additional bias generator are given. A closed-loop electron drift plasma chemical reactor and gas mixtures containin...

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Bibliographic Details
Date:2021
Main Authors: Fedorovich, O.A., Hladkovska, O.V., Hladkovskyi, V.V., Nedybaliuk, A.F.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2021
Series:Вопросы атомной науки и техники
Subjects:
Applications and technologies
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Features of plasma chemical etching of lithium tantalate substrate (LiTaO₃) / O.A. Fedorovich, O.V. Hladkovska, V.V. Hladkovskyi, A.F. Nedybaliuk // Problems of Atomic Science and Technology. — 2021. — № 4. — С. 188-190. — Бібліогр.: 4 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine

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