Features of plasma chemical etching of lithium tantalate substrate (LiTaO₃)
The results of researches of plasma chemical treatment of lithium monocrystalline tantalate (LiTaO₃) from gas type, bias voltage (energy of chemically active ions) and from current of additional bias generator are given. A closed-loop electron drift plasma chemical reactor and gas mixtures containin...
Saved in:
| Date: | 2021 |
|---|---|
| Main Authors: | , , , |
| Format: | Article |
| Language: | English |
| Published: |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2021
|
| Series: | Вопросы атомной науки и техники |
| Subjects: | |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Features of plasma chemical etching of lithium tantalate substrate (LiTaO₃) / O.A. Fedorovich, O.V. Hladkovska, V.V. Hladkovskyi, A.F. Nedybaliuk // Problems of Atomic Science and Technology. — 2021. — № 4. — С. 188-190. — Бібліогр.: 4 назв. — англ. |
Institution
Digital Library of Periodicals of National Academy of Sciences of UkraineBe the first to leave a comment!