Application of arc plasma for a deposition of superconducting films

Application of arc plasma for a deposition of superconducting films

This work was supported mainly by Italian INFN grant ARCO and DESY. The authors are grateful to Dr. S.Calatroni and Dr. C.Benvenuti of CERN for constant support of cathodes and samples substrates. We would like to thank Prof. M.Sadowski for help in the arrangement of the new laboratory in Swierk an...

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Bibliographic Details
Date:2002
Main Authors: Langner, J., Russo, R., Catani, L., Tazzari, S., Cirillo, M., Czaus, K., Merlo, V., Tazzioli, F., Proch, D., Koval, N.N., Lopatin, I.V.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2002
Series:Вопросы атомной науки и техники
Subjects:
Low temperature plasma and plasma technologies
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Application of arc plasma for a deposition of superconducting films / J. Langner, R. Russo, L. Catani, S. Tazzari, M. Cirillo, K. Czaus, V. Merlo, F. Tazzioli, D. Proch, N.N. Koval, I.V. Lopatin // Вопросы атомной науки и техники. — 2002. — № 4. — С. 161-164. — Бібліогр.: 4 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine

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