Critical energy in the cyclotron heating of ions in an ECR plasma source
The problem of plasma cyclotron heating in ECR plasma sources, to sustain the discharge, remains important at present. There are two methods for the analysis of this problem. The first one is the one particle stochastic mechanism and the second one is related with the non-linear interaction of waves...
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Дата: | 2002 |
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Національний науковий центр «Харківський фізико-технічний інститут» НАН України
2002
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Назва видання: | Вопросы атомной науки и техники |
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Цитувати: | Critical energy in the cyclotron heating of ions in an ECR plasma source / C. Gutiérrez-Tapia, O. Hernández-Aguirre // Вопросы атомной науки и техники. — 2002. — № 4. — С. 165-167. — Бібліогр.: 6 назв. — англ. |
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oai:nasplib.isofts.kiev.ua:123456789-803252025-02-23T17:02:57Z Critical energy in the cyclotron heating of ions in an ECR plasma source Gutiérrez-Tapia, C. Hernández-Aguirre, O. Low temperature plasma and plasma technologies The problem of plasma cyclotron heating in ECR plasma sources, to sustain the discharge, remains important at present. There are two methods for the analysis of this problem. The first one is the one particle stochastic mechanism and the second one is related with the non-linear interaction of waves where the collective behaviour of particles becomes the most important. In this work, in the Hamilton formalism, the stochastic mechanism of the cyclotron heating is analyzed. It is considered the case of an ECR plasma source where a TE11 electromagnetic wave is applied. The critical energy for the resonance mixing is calculated an by the “section-of-surface” method the inhomogeneity of the external magnetic field is analyzed. This work was partially supported by project CONACyT 33873-E 2002 Article Critical energy in the cyclotron heating of ions in an ECR plasma source / C. Gutiérrez-Tapia, O. Hernández-Aguirre // Вопросы атомной науки и техники. — 2002. — № 4. — С. 165-167. — Бібліогр.: 6 назв. — англ. 1562-6016 PACS: 52.50.-b https://nasplib.isofts.kiev.ua/handle/123456789/80325 en Вопросы атомной науки и техники application/pdf Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
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Digital Library of Periodicals of National Academy of Sciences of Ukraine |
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DSpace DC |
language |
English |
topic |
Low temperature plasma and plasma technologies Low temperature plasma and plasma technologies |
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Low temperature plasma and plasma technologies Low temperature plasma and plasma technologies Gutiérrez-Tapia, C. Hernández-Aguirre, O. Critical energy in the cyclotron heating of ions in an ECR plasma source Вопросы атомной науки и техники |
description |
The problem of plasma cyclotron heating in ECR plasma sources, to sustain the discharge, remains important at present. There are two methods for the analysis of this problem. The first one is the one particle stochastic mechanism and the second one is related with the non-linear interaction of waves where the collective behaviour of particles becomes the most important. In this work, in the Hamilton formalism, the stochastic mechanism of the cyclotron heating is analyzed. It is considered the case of an ECR plasma source where a TE11 electromagnetic wave is applied. The critical energy for the resonance mixing is calculated an by the “section-of-surface” method the inhomogeneity of the external magnetic field is analyzed. |
format |
Article |
author |
Gutiérrez-Tapia, C. Hernández-Aguirre, O. |
author_facet |
Gutiérrez-Tapia, C. Hernández-Aguirre, O. |
author_sort |
Gutiérrez-Tapia, C. |
title |
Critical energy in the cyclotron heating of ions in an ECR plasma source |
title_short |
Critical energy in the cyclotron heating of ions in an ECR plasma source |
title_full |
Critical energy in the cyclotron heating of ions in an ECR plasma source |
title_fullStr |
Critical energy in the cyclotron heating of ions in an ECR plasma source |
title_full_unstemmed |
Critical energy in the cyclotron heating of ions in an ECR plasma source |
title_sort |
critical energy in the cyclotron heating of ions in an ecr plasma source |
publisher |
Національний науковий центр «Харківський фізико-технічний інститут» НАН України |
publishDate |
2002 |
topic_facet |
Low temperature plasma and plasma technologies |
citation_txt |
Critical energy in the cyclotron heating of ions in an ECR plasma source / C. Gutiérrez-Tapia, O. Hernández-Aguirre // Вопросы атомной науки и техники. — 2002. — № 4. — С. 165-167. — Бібліогр.: 6 назв. — англ. |
series |
Вопросы атомной науки и техники |
work_keys_str_mv |
AT gutierreztapiac criticalenergyinthecyclotronheatingofionsinanecrplasmasource AT hernandezaguirreo criticalenergyinthecyclotronheatingofionsinanecrplasmasource |
first_indexed |
2025-07-22T04:08:39Z |
last_indexed |
2025-07-22T04:08:39Z |
_version_ |
1838318689599881216 |