Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures
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| Datum: | 2009 |
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| Format: | Artikel |
| Sprache: | English |
| Veröffentlicht: |
2009
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| Schriftenreihe: | Physical surface engineering |
| Online Zugang: | http://jnas.nbuv.gov.ua/article/UJRN-0000872969 |
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| Назва журналу: | Library portal of National Academy of Sciences of Ukraine | LibNAS |
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open-sciencenbuvgovua-1078522024-04-17T19:15:57Z Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures S. V. Dudin 1999-8074 2009 en Physical surface engineering http://jnas.nbuv.gov.ua/article/UJRN-0000872969 Article |
| institution |
Library portal of National Academy of Sciences of Ukraine | LibNAS |
| collection |
Open-Science |
| language |
English |
| series |
Physical surface engineering |
| spellingShingle |
Physical surface engineering S. V. Dudin Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures |
| format |
Article |
| author |
S. V. Dudin |
| author_facet |
S. V. Dudin |
| author_sort |
S. V. Dudin |
| title |
Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures |
| title_short |
Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures |
| title_full |
Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures |
| title_fullStr |
Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures |
| title_full_unstemmed |
Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures |
| title_sort |
research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures |
| publishDate |
2009 |
| url |
http://jnas.nbuv.gov.ua/article/UJRN-0000872969 |
| work_keys_str_mv |
AT svdudin researchanddevelopmentoftechnologicalsystemsbasedonhighfrequencyinductiondischargeforreactiveionplasmaetchingofmicroandnanostructures |
| first_indexed |
2024-04-18T06:12:16Z |
| last_indexed |
2024-04-18T06:12:16Z |
| _version_ |
1796888535513432064 |