Comparison of properties inherent to thin titanium oxide films formed by rapid thermal annealing on SiC and porous SiC substrates
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| Datum: | 2018 |
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| Hauptverfasser: | , , , , , , , , |
| Format: | Artikel |
| Sprache: | English |
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2018
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| Schriftenreihe: | Semiconductor Physics, Quantum Electronics and Optoelectronics |
| Online Zugang: | http://jnas.nbuv.gov.ua/article/UJRN-0000899779 |
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open-sciencenbuvgovua-277572024-02-27T21:48:51Z Comparison of properties inherent to thin titanium oxide films formed by rapid thermal annealing on SiC and porous SiC substrates Yu. Yu. Bacherikov N. L. Dmitruk R. V. Konakova O. F. Kolomys O. B. Okhrimenko V. V. Strelchuk O. S. Lytvyn L. M. Kapitanchuk A. M. Svetlichnyi 1560-8034 2018 en Semiconductor Physics, Quantum Electronics and Optoelectronics http://jnas.nbuv.gov.ua/article/UJRN-0000899779 Article |
| institution |
Library portal of National Academy of Sciences of Ukraine | LibNAS |
| collection |
Open-Science |
| language |
English |
| series |
Semiconductor Physics, Quantum Electronics and Optoelectronics |
| spellingShingle |
Semiconductor Physics, Quantum Electronics and Optoelectronics Yu. Yu. Bacherikov N. L. Dmitruk R. V. Konakova O. F. Kolomys O. B. Okhrimenko V. V. Strelchuk O. S. Lytvyn L. M. Kapitanchuk A. M. Svetlichnyi Comparison of properties inherent to thin titanium oxide films formed by rapid thermal annealing on SiC and porous SiC substrates |
| format |
Article |
| author |
Yu. Yu. Bacherikov N. L. Dmitruk R. V. Konakova O. F. Kolomys O. B. Okhrimenko V. V. Strelchuk O. S. Lytvyn L. M. Kapitanchuk A. M. Svetlichnyi |
| author_facet |
Yu. Yu. Bacherikov N. L. Dmitruk R. V. Konakova O. F. Kolomys O. B. Okhrimenko V. V. Strelchuk O. S. Lytvyn L. M. Kapitanchuk A. M. Svetlichnyi |
| author_sort |
Yu. Yu. Bacherikov |
| title |
Comparison of properties inherent to thin titanium oxide films formed by rapid thermal annealing on SiC and porous SiC substrates |
| title_short |
Comparison of properties inherent to thin titanium oxide films formed by rapid thermal annealing on SiC and porous SiC substrates |
| title_full |
Comparison of properties inherent to thin titanium oxide films formed by rapid thermal annealing on SiC and porous SiC substrates |
| title_fullStr |
Comparison of properties inherent to thin titanium oxide films formed by rapid thermal annealing on SiC and porous SiC substrates |
| title_full_unstemmed |
Comparison of properties inherent to thin titanium oxide films formed by rapid thermal annealing on SiC and porous SiC substrates |
| title_sort |
comparison of properties inherent to thin titanium oxide films formed by rapid thermal annealing on sic and porous sic substrates |
| publishDate |
2018 |
| url |
http://jnas.nbuv.gov.ua/article/UJRN-0000899779 |
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2025-07-17T15:04:37Z |
| last_indexed |
2025-07-17T15:04:37Z |
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