APA-Zitierstil (7. Ausg.)

Fomin, A. V., Pashchenko, G. A., Kravetskyi, Y., & Lutsyshyn, I. G. (2017). Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing.

Chicago-Zitierstil (17. Ausg.)

Fomin, A. V., G. A. Pashchenko, Yu Kravetskyi, und I. G. Lutsyshyn. Model of Smoothing Roughness on GaAs Wafer Surface by Using Nonabrasive Chemical-and-mechanical Polishing. 2017.

MLA-Zitierstil (8. Ausg.)

Fomin, A. V., et al. Model of Smoothing Roughness on GaAs Wafer Surface by Using Nonabrasive Chemical-and-mechanical Polishing. 2017.