The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method
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| Datum: | 2017 |
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| Sprache: | English |
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2017
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| Schriftenreihe: | Semiconductor Physics, Quantum Electronics and Optoelectronics |
| Online Zugang: | http://jnas.nbuv.gov.ua/article/UJRN-0000778507 |
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open-sciencenbuvgovua-383962024-02-29T11:41:15Z The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method A. I. Ievtushenko M. G. Dusheyko V. A. Karpyna O. I. Bykov P. M. Lytvyn O. I. Olifan V. A. Levchenko A. A. Korchovyi S. P. Starik S. V. Tkach E. F. Kuzmenko G. V. Lashkarev 1560-8034 2017 en Semiconductor Physics, Quantum Electronics and Optoelectronics http://jnas.nbuv.gov.ua/article/UJRN-0000778507 Article |
| institution |
Library portal of National Academy of Sciences of Ukraine | LibNAS |
| collection |
Open-Science |
| language |
English |
| series |
Semiconductor Physics, Quantum Electronics and Optoelectronics |
| spellingShingle |
Semiconductor Physics, Quantum Electronics and Optoelectronics A. I. Ievtushenko M. G. Dusheyko V. A. Karpyna O. I. Bykov P. M. Lytvyn O. I. Olifan V. A. Levchenko A. A. Korchovyi S. P. Starik S. V. Tkach E. F. Kuzmenko G. V. Lashkarev The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method |
| format |
Article |
| author |
A. I. Ievtushenko M. G. Dusheyko V. A. Karpyna O. I. Bykov P. M. Lytvyn O. I. Olifan V. A. Levchenko A. A. Korchovyi S. P. Starik S. V. Tkach E. F. Kuzmenko G. V. Lashkarev |
| author_facet |
A. I. Ievtushenko M. G. Dusheyko V. A. Karpyna O. I. Bykov P. M. Lytvyn O. I. Olifan V. A. Levchenko A. A. Korchovyi S. P. Starik S. V. Tkach E. F. Kuzmenko G. V. Lashkarev |
| author_sort |
A. I. Ievtushenko |
| title |
The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method |
| title_short |
The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method |
| title_full |
The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method |
| title_fullStr |
The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method |
| title_full_unstemmed |
The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method |
| title_sort |
influence of substrate temperature on properties of cu-al-o films deposited using the reactive ion beam sputtering method |
| publishDate |
2017 |
| url |
http://jnas.nbuv.gov.ua/article/UJRN-0000778507 |
| work_keys_str_mv |
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| first_indexed |
2025-07-17T18:57:35Z |
| last_indexed |
2025-07-17T18:57:35Z |
| _version_ |
1837921885294166016 |