The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method

The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method

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Bibliographische Detailangaben
Datum:	2017
Hauptverfasser:	A. I. Ievtushenko, M. G. Dusheyko, V. A. Karpyna, O. I. Bykov, P. M. Lytvyn, O. I. Olifan, V. A. Levchenko, A. A. Korchovyi, S. P. Starik, S. V. Tkach, E. F. Kuzmenko, G. V. Lashkarev
Format:	Artikel
Sprache:	English
Veröffentlicht:	2017
Schriftenreihe:	Semiconductor Physics, Quantum Electronics and Optoelectronics
Online Zugang:	http://jnas.nbuv.gov.ua/article/UJRN-0000778507
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:	Library portal of National Academy of Sciences of Ukraine \| LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS

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