Yasunas, A., Kotov, D., Shiripov, V., & Radzionay, U. (2013). Low-temperature deposition of silicon dioxide films in high-density plasma.
Chicago Style (17th ed.) CitationYasunas, A., D. Kotov, V. Shiripov, and U. Radzionay. Low-temperature Deposition of Silicon Dioxide Films in High-density Plasma. 2013.
MLA (8th ed.) CitationYasunas, A., et al. Low-temperature Deposition of Silicon Dioxide Films in High-density Plasma. 2013.
Warning: These citations may not always be 100% accurate.