Temperature and laser annealing of nonstoichiometric SiOx films
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Datum: | 2013 |
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Format: | Artikel |
Sprache: | English |
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2013
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Schriftenreihe: | Surface |
Online Zugang: | http://jnas.nbuv.gov.ua/article/UJRN-0000516567 |
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open-sciencenbuvgovua-857882024-04-16T18:47:46Z Temperature and laser annealing of nonstoichiometric SiOx films O. O. Havryliuk Yu. Semchuk 2617-5975 2013 en Surface http://jnas.nbuv.gov.ua/article/UJRN-0000516567 Article |
institution |
Library portal of National Academy of Sciences of Ukraine | LibNAS |
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Open-Science |
language |
English |
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Surface |
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Surface O. O. Havryliuk Yu. Semchuk Temperature and laser annealing of nonstoichiometric SiOx films |
format |
Article |
author |
O. O. Havryliuk Yu. Semchuk |
author_facet |
O. O. Havryliuk Yu. Semchuk |
author_sort |
O. O. Havryliuk |
title |
Temperature and laser annealing of nonstoichiometric SiOx films |
title_short |
Temperature and laser annealing of nonstoichiometric SiOx films |
title_full |
Temperature and laser annealing of nonstoichiometric SiOx films |
title_fullStr |
Temperature and laser annealing of nonstoichiometric SiOx films |
title_full_unstemmed |
Temperature and laser annealing of nonstoichiometric SiOx films |
title_sort |
temperature and laser annealing of nonstoichiometric siox films |
publishDate |
2013 |
url |
http://jnas.nbuv.gov.ua/article/UJRN-0000516567 |
work_keys_str_mv |
AT oohavryliuk temperatureandlaserannealingofnonstoichiometricsioxfilms AT yusemchuk temperatureandlaserannealingofnonstoichiometricsioxfilms |
first_indexed |
2025-07-22T10:46:16Z |
last_indexed |
2025-07-22T10:46:16Z |
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1838344117165228032 |