APA (7th ed.) Citation

Rudenko, R. M., Voitovych, V. V., Krasko, M. M., Kolosiuk, A. H., Kraichynskyi, A. M., Yukhymchuk, V. O., & Makara, V. A. (2013). Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin.

Chicago Style (17th ed.) Citation

Rudenko, R. M., V. V. Voitovych, M. M. Krasko, A. H. Kolosiuk, A. M. Kraichynskyi, V. O. Yukhymchuk, and V. A. Makara. Influence of High Temperature Annealing on the Structure and the Intrinsic Absorption Edge of Thin-film Silicon Doped with Tin. 2013.

MLA (8th ed.) Citation

Rudenko, R. M., et al. Influence of High Temperature Annealing on the Structure and the Intrinsic Absorption Edge of Thin-film Silicon Doped with Tin. 2013.