Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin
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Datum: | 2013 |
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Format: | Artikel |
Sprache: | English |
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2013
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Schriftenreihe: | Ukrainian Journal of Physics |
Online Zugang: | http://jnas.nbuv.gov.ua/article/UJRN-0000725577 |
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open-sciencenbuvgovua-873722024-04-16T18:57:48Z Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin R. M. Rudenko V. V. Voitovych M. M. Krasko A. H. Kolosiuk A. M. Kraichynskyi V. O. Yukhymchuk V. A. Makara 0372-400X 2013 en Ukrainian Journal of Physics http://jnas.nbuv.gov.ua/article/UJRN-0000725577 Article |
institution |
Library portal of National Academy of Sciences of Ukraine | LibNAS |
collection |
Open-Science |
language |
English |
series |
Ukrainian Journal of Physics |
spellingShingle |
Ukrainian Journal of Physics R. M. Rudenko V. V. Voitovych M. M. Krasko A. H. Kolosiuk A. M. Kraichynskyi V. O. Yukhymchuk V. A. Makara Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin |
format |
Article |
author |
R. M. Rudenko V. V. Voitovych M. M. Krasko A. H. Kolosiuk A. M. Kraichynskyi V. O. Yukhymchuk V. A. Makara |
author_facet |
R. M. Rudenko V. V. Voitovych M. M. Krasko A. H. Kolosiuk A. M. Kraichynskyi V. O. Yukhymchuk V. A. Makara |
author_sort |
R. M. Rudenko |
title |
Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin |
title_short |
Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin |
title_full |
Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin |
title_fullStr |
Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin |
title_full_unstemmed |
Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin |
title_sort |
influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin |
publishDate |
2013 |
url |
http://jnas.nbuv.gov.ua/article/UJRN-0000725577 |
work_keys_str_mv |
AT rmrudenko influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin AT vvvoitovych influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin AT mmkrasko influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin AT ahkolosiuk influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin AT amkraichynskyi influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin AT voyukhymchuk influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin AT vamakara influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin |
first_indexed |
2025-07-22T11:17:03Z |
last_indexed |
2025-07-22T11:17:03Z |
_version_ |
1838346000007168000 |