Comparison of optical properties of TiO2 thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques
Saved in:
Date: | 2011 |
---|---|
Main Authors: | V. V. Brus, Z. D. Kovalyuk, O. A. Parfenyuk, N. D. Vakhnyak |
Format: | Article |
Language: | English |
Published: |
2011
|
Series: | Semiconductor Physics, Quantum Electronics and Optoelectronics |
Online Access: | http://jnas.nbuv.gov.ua/article/UJRN-0000349824 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Journal Title: | Library portal of National Academy of Sciences of Ukraine | LibNAS |
Institution
Library portal of National Academy of Sciences of Ukraine | LibNASSimilar Items
-
Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques
by: Brus, V.V., et al.
Published: (2011) -
Development of arc suppression technique for reactive magnetron sputtering
by: S. V. Dudin, et al.
Published: (2005) -
Development of arc suppression technique for reactive magnetron sputtering
by: Dudin, S.V., et al.
Published: (2005) -
Synthesis of thin-film Ta₂O₅ coatings by reactive magnetron sputtering
by: Yakovin, S., et al.
Published: (2016) -
Structural and optical properties of Zn₁₋xCoxO thin films prepared by RF reactive sputtering technique
by: Savchuk, A.I., et al.
Published: (2014)