Осадження металічних плівок на мікрочастинки у пастці ВЧ магнетронного розряду
The technique for a metal film deposition on spherical microparticles in an RF plasma trap is presented. Both the particle confinement and the electrode sputtering are performed by a single RF magnetron discharge. The samples of a coated spheres are obtained and examined. The technique allows confin...
Збережено в:
| Дата: | 2022 |
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| Автори: | , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
Publishing house "Academperiodika"
2022
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| Теми: | |
| Онлайн доступ: | https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2021437 |
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| Назва журналу: | Ukrainian Journal of Physics |
Репозитарії
Ukrainian Journal of Physics| Резюме: | The technique for a metal film deposition on spherical microparticles in an RF plasma trap is presented. Both the particle confinement and the electrode sputtering are performed by a single RF magnetron discharge. The samples of a coated spheres are obtained and examined. The technique allows confining the particles near to the sputtered region close to the border zone of ballistic bombardment by sputtered atoms. |
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