Features of electrochemical processes at the boundary p-GaAs-HF water solution

von G. A. Pashchenko, Yu. Kravetskyi, L. I. Trishchuk
Veröffentlicht 2018

Modeling the process of removal aimed at cut traces on semiconductor wafers by using the method of contactless chemical-and-dynamical polishing

von G. A. Pashchenko, Yu. Kravetskyi, A. V. Fomin
Veröffentlicht 2015

Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing

von A. V. Fomin, G. A. Pashchenko, Yu. Kravetskyi, I. G. Lutsyshyn
Veröffentlicht 2017