Features of electrochemical processes at the boundary p-GaAs-HF water solution

by G. A. Pashchenko, Yu. Kravetskyi, L. I. Trishchuk
Published 2018

Modeling the process of removal aimed at cut traces on semiconductor wafers by using the method of contactless chemical-and-dynamical polishing

by G. A. Pashchenko, Yu. Kravetskyi, A. V. Fomin
Published 2015

Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing

by A. V. Fomin, G. A. Pashchenko, Yu. Kravetskyi, I. G. Lutsyshyn
Published 2017