Spectroscopic studies of RF discharge plasma at plasma-chemical etching of gallium nitride epitaxial structures

by V. V. Hladkovskiy, O. A. Fedorovich
Published 2017

Investigation of the influence of oxygen on the rate and anisotropy of deep etching of silicon in the plasma-chemical reactor with the controlled magnetic field

by V. V. Gladkovskij, O. A. Fedorovich
Published 2017

Spectroscopic studies of RF discharge plasma at plasma-chemical etching of gallium nitride epitaxial structures

by V. V. Hladkovskiy, O. A. Fedorovich
Published 2017

Lifetime of electrons in dense plasma

by O. A. Fedorovich, L. M. Voitenko
Published 2017

Influence of the plasma chemical etching on the silicon plates surface of photo electric converters

by B. P. Polozov, O. A. Fedorovich, V. N. Golotjuk, A. A. Marinenko, D. V. Lukomskij
Published 2006

The influence of HF discharge parameters and heater settings on the substrate temperature in the plasma-chemical reactor "Almaz" for the synthesis of diamond-like carbon...

by V. V. Gladkovskij, E. G. Kostin, B. P. Polozov, O. A. Fedorovich, V. A. Petrjakov
Published 2014

Modulation polarimetry of full internal reflection, broken by diamond-like films

by L. S. Maksimenko, O. N. Mishchuk, I. E. Matjash, B. K. Serdega, E. G. Kostin, B. P. Polozov, O. A. Fedorovich, G. K. Savinkov
Published 2013