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Yoshimura, K.
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Yoshimura, K.
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Industrial applications of TiO₂ films deposited by electron-beam-excited plasma of meter-size
by
Famakinwa, T.
,
Ikezawa, S.
,
Homyara, H.
,
Yoshioka, T.
,
Nakamura, K.
,
Ninomiya, Y.
,
Oda, H.
,
Hara, T.
,
Hori, M.
,
Fujii, S.
,
Yoshimura, K.
,
Taoda, H.
Published 2000
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Related Subjects
Low Temperature Plasma and Plasma Technologies