Gas magnetron deposition of structured TiO₂ nanofilms

The paper describes the peculiarities of deposition nano-sized titanium dioxide coatings in the cylindrical inverted gas magnetron. It is shown the influence of the main parameters magnetron sputtering, like as working gas pressure and temperature of substrate, on film grain size, porosity and optic...

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Bibliographic Details
Date:2013
Main Authors: Dobrovolskiy, A.M., Goncharov, A.A., Kostin, E.G., Frolova, E.K.
Format: Article
Language:English
Published: Національний науковий центр «Харківський фізико-технічний інститут» НАН України 2013
Series:Вопросы атомной науки и техники
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Online Access:http://dspace.nbuv.gov.ua/handle/123456789/112173
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Journal Title:Digital Library of Periodicals of National Academy of Sciences of Ukraine
Cite this:Gas magnetron deposition of structured TiO₂ nanofilms / A.M. Dobrovolskiy, A.A. Goncharov, E.G. Kostin, E.K. Frolova // Вопросы атомной науки и техники. — 2013. — № 4. — С. 311-314. — Бібліогр.: 11 назв. — англ.

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Digital Library of Periodicals of National Academy of Sciences of Ukraine