Dissolution of indium arsenide in nitric solutions of the hydrobromic acid
Dissolution of InAs in HNO₃-HBr-H₂O solutions is studied. The surface of equal etching rates is constructed, and the limiting stages of the dissolution process are determined. Depending on the [HNO₃]/[HBr] ratio, InAs dissolution may be limited by kinetic, or diffusion, or combined mechanisms. The d...
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| Date: | 1999 |
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| Main Authors: | , , |
| Format: | Article |
| Language: | English |
| Published: |
Інститут фізики напівпровідників імені В.Є. Лашкарьова НАН України
1999
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| Series: | Semiconductor Physics Quantum Electronics & Optoelectronics |
| Online Access: | http://dspace.nbuv.gov.ua/handle/123456789/117925 |
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| Journal Title: | Digital Library of Periodicals of National Academy of Sciences of Ukraine |
| Cite this: | Dissolution of indium arsenide in nitric solutions of the hydrobromic acid / Z.F. Tomashik, S.G. Danylenko, V.N. Tomashik // Semiconductor Physics Quantum Electronics & Optoelectronics. — 1999. — Т. 2, № 1. — С. 80-83. — Бібліогр.: 9 назв. — англ. |